Improving the thermal stability of nickel monosilicide thin films by combining annealing with the use of an interlayer and a capping layer

2011 ◽  
Vol 29 (3) ◽  
pp. 031503 ◽  
Author(s):  
Bong-Jun Park ◽  
Sang-Yong Jeong ◽  
Jun-Ho Kim ◽  
Tae-Yeon Seong ◽  
Chel-Jong Choi
Keyword(s):  
Thin Films ◽  
Thermal Stability ◽  
Capping Layer ◽  
Thermal Stability Of

Mechanisms for the enhancement of the thermal stability of organic thin films by aluminum oxide capping layers

2006 ◽  
Vol 21 (2) ◽  
pp. 455-464 ◽  
Author(s):  
S. Sellner ◽  
A. Gerlach ◽  
F. Schreiber ◽  
M. Kelsch ◽  
N. Kasper ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermal Stability ◽  
Aluminum Oxide ◽  
Elevated Temperatures ◽  
Organic Thin Films ◽  
Organic Films ◽  
Capping Layer ◽  
Ambient Gases ◽  
Complementary Techniques ◽  
Thermal Stability Of

We present a detailed study of the thermal stability of organic thin films of diindenoperylene encapsulated by sputtered aluminum oxide layers. We studied the influence of capping layer thickness, stoichiometry, and heating rate on the thermal stability of capped films and their eventual breakdown. Under optimized encapsulation conditions (thick and stoichiometric capping layer), the organic films desorb only at temperatures 200 °C above the desorption of the uncapped film. Moreover, the capped organic films retain their crystalline order at these elevated temperatures, whereas they would normally (i.e., uncapped) be in the gas phase. This study therefore also shows a way of studying organic materials under temperature conditions normally inaccessible. Considering results from complementary techniques, we discuss possible scenarios for the eventual breakdown. The results have implications for the performance and long-term stability of organic devices for which stability against elevated temperatures as well as against exposure to ambient gases is crucial.

scholarly journals The role of the substrate on the mechanical and thermal stability of Pd thin films during hydrogen (de)sorption

2021 ◽  
Vol 46 (5) ◽  
pp. 4137-4153
Author(s):  
Neha Verma ◽  
Rob Delhez ◽  
Niek M. van der Pers ◽  
Frans D. Tichelaar ◽  
Amarante J. Böttger
Keyword(s):  
Thin Films ◽  
Thermal Stability ◽  
Thermal Stability Of

Effects of nitrogen ion implantation on the thermal stability of tungsten thin films

1998 ◽  
Vol 16 (2) ◽  
pp. 477-481 ◽  
Author(s):  
Yong Tae Kim ◽  
Chul Soon Kwon ◽  
Dong Joon Kim ◽  
Jong-Wan Park ◽  
Chang Woo Lee
Keyword(s):  
Thin Films ◽  
Thermal Stability ◽  
Ion Implantation ◽  
Nitrogen Ion Implantation ◽  
Nitrogen Ion ◽  
Thermal Stability Of

Thermal stability of plasma deposited thin films of hydrogenated carbon–nitrogen alloys

1999 ◽  
Vol 86 (11) ◽  
pp. 6276-6281 ◽  
Author(s):  
J. V. Anguita ◽  
S. R. P. Silva ◽  
A. P. Burden ◽  
B. J. Sealy ◽  
S. Haq ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermal Stability ◽  
Thermal Stability Of
Sign in / Sign up

Export Citation Format

Share Document