On the role of Ti adlayers for resistive switching in HfO2-based metal-insulator-metal structures: Top versus bottom electrode integration

Author(s):  
Ch. Walczyk ◽  
Ch. Wenger ◽  
D. Walczyk ◽  
M. Lukosius ◽  
I. Costina ◽  
...  
2014 ◽  
Vol 12 (1-2) ◽  
pp. 246-249 ◽  
Author(s):  
M. Menghini ◽  
C. Quinteros ◽  
C.-Y Su ◽  
P. Homm ◽  
P. Levy ◽  
...  

2014 ◽  
Vol 312 ◽  
pp. 112-116 ◽  
Author(s):  
Peter Jančovič ◽  
Boris Hudec ◽  
Edmund Dobročka ◽  
Ján Dérer ◽  
Ján Fedor ◽  
...  

2014 ◽  
Vol 40 (2) ◽  
pp. 101-103 ◽  
Author(s):  
O. N. Gorshkov ◽  
I. N. Antonov ◽  
A. I. Belov ◽  
A. P. Kasatkin ◽  
A. N. Mikhaylov

Nanoscale ◽  
2018 ◽  
Vol 10 (37) ◽  
pp. 17983-17989 ◽  
Author(s):  
Christian Stelling ◽  
Stefan Fossati ◽  
Jakub Dostalek ◽  
Markus Retsch

Metal–insulator–metal structures prepared by self-assembly exhibit narrow gap plasmon modes, which are fully described by analytical theory.


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