Resistive switching in TiO2-based metal–insulator–metal structures with Al2O3 barrier layer at the metal/dielectric interface

2014 ◽  
Vol 563 ◽  
pp. 10-14 ◽  
Author(s):  
B. Hudec ◽  
A. Paskaleva ◽  
P. Jančovič ◽  
J. Dérer ◽  
J. Fedor ◽  
...  
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M. Menghini ◽  
C. Quinteros ◽  
C.-Y Su ◽  
P. Homm ◽  
P. Levy ◽  
...  

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Boris Hudec ◽  
Edmund Dobročka ◽  
Ján Dérer ◽  
Ján Fedor ◽  
...  

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A. P. Kasatkin ◽  
A. N. Mikhaylov

Nanoscale ◽  
2018 ◽  
Vol 10 (37) ◽  
pp. 17983-17989 ◽  
Author(s):  
Christian Stelling ◽  
Stefan Fossati ◽  
Jakub Dostalek ◽  
Markus Retsch

Metal–insulator–metal structures prepared by self-assembly exhibit narrow gap plasmon modes, which are fully described by analytical theory.


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