Correlation of plasma characteristics to etch rate and via sidewall angle in a deep reactive ion etch system using Langmuir probe and optical emission spectroscopy
2011 ◽
Vol 29
(1)
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pp. 011008
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2001 ◽
Vol 34
(18)
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pp. 2854-2861
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2010 ◽
Vol 12
(3)
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pp. 314-319
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2002 ◽
Vol 372-376
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pp. 1087-1090
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