Langmuir probe and optical emission spectroscopy studies in magnetron sputtering plasmas for Al-doped ZnO film deposition

2015 ◽  
Vol 117 (2) ◽  
pp. 023301 ◽  
Author(s):  
B. B. Sahu ◽  
Jeon G. Han ◽  
Masaru Hori ◽  
Keigo Takeda
2010 ◽  
Vol 12 (3) ◽  
pp. 314-319 ◽  
Author(s):  
E. F Mendez-Martinez ◽  
P. G Reyes ◽  
D Osorio-Gonzalez ◽  
F Castillo ◽  
H Martinez

2012 ◽  
Vol 370 ◽  
pp. 012047
Author(s):  
A Guerrero ◽  
L Salazar-Flores ◽  
C Torres-Segundo ◽  
H Martínez ◽  
P G Reyes ◽  
...  

1997 ◽  
Vol 493 ◽  
Author(s):  
F. Ayguavives ◽  
P. Aubert ◽  
B. Ea-Kim ◽  
B. Agius

ABSTRACTLead zirconate titanate (PZT) thin films have been grown by rf magnetron sputtering on Si substrates from a metallic target of nominal composition Pb1.1(Zr0.4 Ti0.6 in a reactive argon / oxygen gas mixture. During plasma deposition, in situ Optical Emission Spectroscopy (OES) measurements show clearly a correlation between the evolution of characteristic atomic emission line intensities (Zr - 386.4 nm, Ti - 399.9 nm, Pb - 405.8 nm and O - 777.2 nm) and the thin-film composition determined by a simultaneous use of Rutherford Backscattering Spectroscopy (RBS) and Nuclear Reaction Analysis (NRA).


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