Combinatorial characterization of transparent conductive properties of Ga-doped ZnO films cosputtered from electron cyclotron resonance and rf magnetron plasma sources

Housei Akazawa

doi:10.1116/1.3328053

Combinatorial characterization of transparent conductive properties of Ga-doped ZnO films cosputtered from electron cyclotron resonance and rf magnetron plasma sources

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.3328053 ◽

2010 ◽

Vol 28 (2) ◽

pp. 314-321 ◽

Cited By ~ 23

Author(s):

Housei Akazawa

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Zno Films ◽

Combinatorial Characterization ◽

Plasma Sources ◽

Doped Zno ◽

Conductive Properties

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Mechanical and transparent conductive properties of ZnO and Ga-doped ZnO films sputtered using electron-cyclotron-resonance plasma on polyethylene naphtalate substrates

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.4831979 ◽

2014 ◽

Vol 32 (2) ◽

pp. 021503 ◽

Cited By ~ 3

Author(s):

Housei Akazawa

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Zno Films ◽

Electron Cyclotron Resonance Plasma ◽

Doped Zno ◽

Conductive Properties ◽

Resonance Plasma

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Modification of transparent conductive ZnO and Ga-doped ZnO films by irradiation with electron cyclotron resonance argon plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.3571603 ◽

2011 ◽

Vol 29 (3) ◽

pp. 031304 ◽

Cited By ~ 10

Author(s):

Housei Akazawa

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Argon Plasma ◽

Electron Cyclotron ◽

Zno Films ◽

Doped Zno

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Structural characterization of epitaxial ZnO films grown on (0001) Al2O3 by electron cyclotron resonance-assisted molecular beam epitaxy

Journal of Crystal Growth ◽

10.1016/s0022-0248(01)00876-4 ◽

2001 ◽

Vol 225 (2-4) ◽

pp. 208-213 ◽

Cited By ~ 6

Author(s):

S.-H. Lim ◽

D. Shindo ◽

H.-B. Kang ◽

K. Nakamura

Keyword(s):

Molecular Beam Epitaxy ◽

Structural Characterization ◽

Cyclotron Resonance ◽

Molecular Beam ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Zno Films

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Single-Crystalline ZnO Films Grown on (0001)Al2O3 Substrate by Electron Cyclotron Resonance-Assisted Molecular Beam Epitaxy Technique

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.l933 ◽

1997 ◽

Vol 36 (Part 2, No. 7B) ◽

pp. L933-L935 ◽

Cited By ~ 24

Author(s):

Hee-Bog Kang ◽

Kiyoshi Nakamura ◽

Kenji Yoshida ◽

Kazuo Ishikawa

Keyword(s):

Molecular Beam Epitaxy ◽

Cyclotron Resonance ◽

Molecular Beam ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Zno Films ◽

Al2o3 Substrate ◽

Single Crystalline

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Chemical and electrical characterization of AlGaAs/GaAs heterojunction bipolar transistors treated by electron cyclotron resonance plasmas

Applied Physics Letters ◽

10.1063/1.107122 ◽

1992 ◽

Vol 60 (16) ◽

pp. 1996-1998 ◽

Cited By ~ 10

Author(s):

P. W. Li ◽

Q. Wang ◽

E. S. Yang

Keyword(s):

Heterojunction Bipolar Transistors ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electrical Characterization ◽

Bipolar Transistors ◽

Electron Cyclotron

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Electron Cyclotron Resonance Plasma Sources and Their Use in Plasma-Assisted Chemical Vapor Deposition of Thin Films

Physics of Thin Films - Plasma Sources for Thin Film Deposition and Etching ◽

10.1016/b978-0-08-092513-4.50007-6 ◽

1994 ◽

pp. 121-233 ◽

Cited By ~ 8

Author(s):

OLEG A. POPOV

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sources ◽

Resonance Plasma

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Etch characterization of a broad‐beam electron cyclotron resonance ion source

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.576610 ◽

1990 ◽

Vol 8 (3) ◽

pp. 2945-2949 ◽

Cited By ~ 1

Author(s):

E. Ghanbari ◽

T. Nguyen ◽

S. Bui ◽

E. Ostan

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Ion Source ◽

Electron Cyclotron ◽

Beam Electron ◽

Broad Beam

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Numerical modeling of the effect of mirror magnetic field strength on electron distributions in electron cyclotron resonance plasma sources

Thin Solid Films ◽

10.1016/j.tsf.2020.138396 ◽

2020 ◽

Vol 714 ◽

pp. 138396

Author(s):

Bin Zhang ◽

Xiaobing Zhang

Keyword(s):

Magnetic Field ◽

Numerical Modeling ◽

Field Strength ◽

Magnetic Field Strength ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Plasma Sources ◽

Electron Distributions ◽

Resonance Plasma

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Poly‐Si etching using electron cyclotron resonance microwave plasma sources with multipole confinement

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578242 ◽

1992 ◽

Vol 10 (4) ◽

pp. 1295-1302 ◽

Cited By ~ 4

Author(s):

S. M. Gorbatkin ◽

L. A. Berry ◽

John Swyers

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Electron Cyclotron ◽

Plasma Sources ◽

Resonance Microwave

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Spectroscopic characterization of the plasma generated during the deposition of AlxGa1−xN films by pulsed laser co-ablation of Al and GaAs targets in electron cyclotron resonance nitrogen plasma

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/48/24/245203 ◽

2015 ◽

Vol 48 (24) ◽

pp. 245203 ◽

Cited By ~ 1

Author(s):

Peipei Liang ◽

Hua Cai ◽

Yanli Li ◽

Xu Yang ◽

Qinghu You ◽

...

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Pulsed Laser ◽

Spectroscopic Characterization ◽

Nitrogen Plasma ◽

Electron Cyclotron

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