scholarly journals Nanoindentation study of thin plasma enhanced chemical vapor deposition SiCOH low-k films modified in He/H2 downstream plasma

2010 ◽  
Vol 28 (1) ◽  
pp. 173-179 ◽  
Author(s):  
Kris Vanstreels ◽  
Adam M. Urbanowicz
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low K ◽  
Thin Plasma

Wafer level microarcing model in 90nm chemical-vapor deposition low-k via etch on 300mm silicon-on-insulator substrate

2006 ◽  
Vol 24 (4) ◽  
pp. 1404-1409 ◽  
Author(s):  
Hai Cong ◽  
Chun Hui Low ◽  
Yelehanka Ramachandramurthy Pradeep ◽  
Xin Zhang ◽  
Perera Chandima ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Silicon On Insulator ◽  
Wafer Level ◽  
Low K ◽  
Insulator Substrate

Plasma Enhanced Chemical Vapor Deposition of Manganese on Low-k Dielectrics for Copper Diffusion Barrier Application

2012 ◽  
Vol 2 (3) ◽  
pp. P25-P27 ◽  
Author(s):  
N. Jourdan ◽  
Y. Barbarin ◽  
K. Croes ◽  
Y. Kong Siew ◽  
S. Van Elshocht ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Diffusion Barrier ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Copper Diffusion ◽  
Low K
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