Understanding the effects of photoacid distribution homogeneity and diffusivity on critical dimension control and line edge roughness in chemically amplified resists

2008 ◽  
Vol 26 (6) ◽  
pp. 2276-2280 ◽  
Author(s):  
Cheng-Tsung Lee ◽  
Richard A. Lawson ◽  
Clifford L. Henderson
Keyword(s):  
Critical Dimension ◽  
Line Edge Roughness ◽  
Chemically Amplified ◽  
Dimension Control ◽  
Edge Roughness ◽  
Chemically Amplified Resists

scholarly journals Heavy metal incorporated helium ion active hybrid non-chemically amplified resists: Nano-patterning with low line edge roughness

AIP Advances ◽  
2017 ◽  
Vol 7 (8) ◽  
pp. 085314 ◽  
Author(s):  
Pulikanti Guruprasad Reddy ◽  
Neha Thakur ◽  
Chien-Lin Lee ◽  
Sheng-Wei Chien ◽  
Chullikkattil P. Pradeep ◽  
...  
Keyword(s):  
Heavy Metal ◽  
Line Edge Roughness ◽  
Chemically Amplified ◽  
Edge Roughness ◽  
Helium Ion ◽  
Chemically Amplified Resists ◽  
Nano Patterning

Line-edge roughness of chemically amplified resists

2000 ◽  
Author(s):  
Tsukasa Azuma ◽  
Kenji Chiba ◽  
Maki Imabeppu ◽  
Daisuke Kawamura ◽  
Yasunobu Onishi
Keyword(s):  
Line Edge Roughness ◽  
Chemically Amplified ◽  
Edge Roughness ◽  
Chemically Amplified Resists

Decomposition Analysis of Chemically Amplified Resists for Improving Critical Dimension Control

2009 ◽  
Vol 48 (6) ◽  
pp. 06FC08 ◽  
Author(s):  
Daiju Shiono ◽  
Hideo Hada ◽  
Taku Hirayama ◽  
Junichi Onodera ◽  
Takeo Watanabe ◽  
...  
Keyword(s):  
Decomposition Analysis ◽  
Critical Dimension ◽  
Chemically Amplified ◽  
Dimension Control ◽  
Chemically Amplified Resists
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