Highly efficient vertical outgassing channels for low-temperature InP-to-silicon direct wafer bonding on the silicon-on-insulator substrate

Author(s):  
D. Liang ◽  
J. E. Bowers
2016 ◽  
Vol 75 (9) ◽  
pp. 345-353 ◽  
Author(s):  
F. Kurz ◽  
T. Plach ◽  
J. Suss ◽  
T. Wagenleitner ◽  
D. Zinner ◽  
...  

2000 ◽  
Vol 36 (7) ◽  
pp. 677 ◽  
Author(s):  
M. Alexe ◽  
V. Dragoi ◽  
M. Reiche ◽  
U. Gösele

2012 ◽  
Vol 195 ◽  
pp. 75-78
Author(s):  
Chung Kyung Jung ◽  
Sung Wook Joo ◽  
Seoung Hun Jeong ◽  
Sang Wook Ryu ◽  
Han Choon Lee ◽  
...  

Over the last decades, the concept of backside illumination (BSI) sensors has become one of the leading solutions to optical challenges such as improved quantum efficiency (QE), and cross-talk, respectively [1-. Direct wafer bonding is a method for fabricating advanced substrates for micro-electrochemical systems (MEMS) and integrated circuits (IC). The most typical example of such an advanced substrate is the silicon-on-insulator (SOI) wafer.


1991 ◽  
Vol 138 (8) ◽  
pp. 2468-2474 ◽  
Author(s):  
A. Yamada ◽  
Bai‐Lin Jiang ◽  
G. A. Rozgonyi ◽  
H. Shirotori ◽  
O. Okabayashi ◽  
...  

2006 ◽  
Vol 88 (12) ◽  
pp. 121901 ◽  
Author(s):  
C. B. Li ◽  
B. W. Cheng ◽  
Y. H. Zuo ◽  
A. P. Morrison ◽  
J. Z. Yu ◽  
...  

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