Fabrication of silicon kinoform lenses for hard x-ray focusing by electron beam lithography and deep reactive ion etching

2008 ◽  
Vol 26 (1) ◽  
pp. 122 ◽  
Author(s):  
Aaron Stein ◽  
Kenneth Evans-Lutterodt ◽  
Natasha Bozovic ◽  
Ashley Taylor
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Deep Reactive Ion Etching ◽  
X Ray

Diamond nanofocusing refractive X-ray lenses made by planar etching technology

2019 ◽  
Vol 26 (5) ◽  
pp. 1554-1557 ◽  
Author(s):  
Mikhail Lyubomirskiy ◽  
Pit Boye ◽  
Jan M. Feldkamp ◽  
Jens Patommel ◽  
Sebastian Schoeder ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Polycrystalline Diamond ◽  
Experimental Tests ◽  
Spot Size ◽  
Fabrication Process ◽  
Ion Etching ◽  
Deep Reactive Ion Etching ◽  
X Ray ◽  
Refractive Lens

The manufacturing steps and first tests of a refractive lens made of polycrystalline diamond are described. A fabrication process based on electron-beam lithography and deep reactive ion etching is introduced. Experimental tests on beamline ID13 at the ESRF have been performed. A spot size of 360 nm (FWHM) at an energy E = 24.3 keV is observed.

Electron beam lithography and reactive ion etching of nanometer size features in niobium films

2001 ◽  
Vol 15 (1-2) ◽  
pp. 171-173 ◽  
Author(s):  
T.T. Piotrowski ◽  
A. Piotrowska ◽  
E. Kamińska ◽  
Z. Szopniewski ◽  
S. Koleśnik ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Nanometer Size
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