Enhanced local oxidation of silicon using a conducting atomic force microscope in water

Author(s):  
A. M. Hilton ◽  
K. W. Jacobson ◽  
B. P. Lynch ◽  
G. J. Simpson
2007 ◽  
Vol 90 (19) ◽  
pp. 191116 ◽  
Author(s):  
C. Delacour ◽  
J. Claudon ◽  
J.-Ph. Poizat ◽  
B. Pannetier ◽  
V. Bouchiat ◽  
...  

1999 ◽  
Vol 584 ◽  
Author(s):  
A. Notargiacomo ◽  
E. Giovine ◽  
E. Cianci ◽  
V. Foglietti ◽  
F. Evangelisti

AbstractScanning probe assisted nanolithography is a very attractive technique in terms of low-cost, patterning resolution and positioning accuracy. Our approach makes use of a commercial atomic force microscope and silicon probes to build simple nanostructures, such as metal electrode pairs, for application in novel quantum devices.Sub-100 nm patterning was successfully performed using three different techniques: direct material removal, scanning probe assisted mask patterning and local oxidation.


2006 ◽  
Vol 17 (13) ◽  
pp. 3299-3303 ◽  
Author(s):  
Jih Shang Hwang ◽  
Zhan Shuo Hu ◽  
Ton Yuan Lu ◽  
Li Wei Chen ◽  
Shi Wei Chen ◽  
...  

2006 ◽  
Vol 17 (3) ◽  
pp. 859-863 ◽  
Author(s):  
Jih Shang Hwang ◽  
Zhan Shuo Hu ◽  
Zen Yu You ◽  
Tai Yuan Lin ◽  
Chin Lian Hsiao ◽  
...  

2008 ◽  
Vol 47 (1) ◽  
pp. 768-770
Author(s):  
Yasuyuki Shimada ◽  
Tsutomu Yamada ◽  
Jun-ichi Shirakashi ◽  
Yasushi Takemura

2008 ◽  
Vol 93 (9) ◽  
pp. 093107 ◽  
Author(s):  
Lishan Weng ◽  
Liyuan Zhang ◽  
Yong P. Chen ◽  
L. P. Rokhinson

1997 ◽  
Vol 71 (2) ◽  
pp. 285-287 ◽  
Author(s):  
Phaedon Avouris ◽  
Tobias Hertel ◽  
Richard Martel

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