Effect of NH3 on the low pressure chemical vapor deposition of TiO2 film at low temperature using tetrakis(diethylamino)titanium and oxygen

2007 ◽  
Vol 25 (2) ◽  
pp. 360-367 ◽  
Author(s):  
Xuemei Song ◽  
Christos G. Takoudis
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Tio2 Film ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Pressure Chemical

Low‐temperature epitaxial growth of silicon by low‐pressure chemical vapor deposition

1988 ◽  
Vol 52 (13) ◽  
pp. 1053-1055 ◽  
Author(s):  
D. Meakin ◽  
M. Stobbs ◽  
J. Stoemenos ◽  
N. A. Economou
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Epitaxial Growth ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Pressure Chemical

Low‐temperature Si/Si1−xGex/Si heterostructure growth at high Ge fractions by low‐pressure chemical vapor deposition

1992 ◽  
Vol 61 (22) ◽  
pp. 2674-2676 ◽  
Author(s):  
Reiner Schütz ◽  
Junichi Murota ◽  
Takahiro Maeda ◽  
Roland Kircher ◽  
Kuniyoshi Yokoo ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Pressure Chemical
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