Controlled chemical mechanical polishing of polysilicon and silicon dioxide for single-electron device
2007 ◽
Vol 25
(4)
◽
pp. 1034-1037
◽
2009 ◽
Vol 156
(12)
◽
pp. H936
◽
2000 ◽
Vol 47
(10)
◽
pp. 1811-1818
◽
2010 ◽
Vol 28
(6)
◽
pp. C6L9-C6L13
◽
2013 ◽
Vol 27
(10)
◽
pp. 2911-2916
◽
2012 ◽
Vol 6
(1)
◽
pp. 115-121
◽
2002 ◽
Vol 61-62
◽
pp. 651-656
◽