Correlation between proton dynamics and line edge roughness in chemically amplified resist for post-optical lithography

2006 ◽  
Vol 24 (6) ◽  
pp. 3066 ◽  
Author(s):  
Akinori Saeki ◽  
Takahiro Kozawa ◽  
Seiichi Tagawa ◽  
Heidi B. Cao
Keyword(s):  
Optical Lithography ◽  
Line Edge Roughness ◽  
Chemically Amplified ◽  
Edge Roughness ◽  
Chemically Amplified Resist ◽  
Proton Dynamics

scholarly journals Line Edge Roughness in Chemically Amplified Resist: Speculation, Simulation and Application

2005 ◽  
Vol 18 (4) ◽  
pp. 457-465 ◽  
Author(s):  
Yukio Nishimura ◽  
Timothy Michelson ◽  
Jason E. Meiring ◽  
Michael D. Stewart ◽  
C. Grant Wilson
Keyword(s):  
Line Edge Roughness ◽  
Chemically Amplified ◽  
Edge Roughness ◽  
Chemically Amplified Resist

Edge Roughness Study of Chemically Amplified Resist in Low-Energy Electron-Beam Lithography Using Computer Simulation

2002 ◽  
Vol 41 (Part 1, No. 6B) ◽  
pp. 4157-4162 ◽  
Author(s):  
Tetsuro Nakasugi ◽  
Atsushi Ando ◽  
Ryoichi Inanami ◽  
Noriaki Sasaki ◽  
Kazuyoshi Sugihara ◽  
...  
Keyword(s):  
Computer Simulation ◽  
Electron Beam ◽  
Electron Beam Lithography ◽  
Low Energy ◽  
Energy Electron ◽  
Chemically Amplified ◽  
Edge Roughness ◽  
Chemically Amplified Resist ◽  
Low Energy Electron
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