Focused ion beam fabrication of two dimensional photonic crystals in silicon-on-insulator

2006 ◽  
Vol 24 (6) ◽  
pp. 2533 ◽  
Author(s):  
K. Balasubramanian ◽  
P. J. Heard ◽  
M. J. Cryan
Keyword(s):  
Photonic Crystals ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Silicon On Insulator ◽  
Two Dimensional

TWO-DIMENSIONAL ORDERED POROUS STRUCTURES FOR PHOTONIC CRYSTALS OBTAINED USING DEEP ANODIC ETCHING AND FOCUSED ION BEAM TECHNIQUES

2004 ◽  
Vol 03 (01n02) ◽  
pp. 81-85
Author(s):  
E. Yu. GAVRILIN ◽  
Yu. B. GORBATOV ◽  
V. V. STARKOV ◽  
A. F. VYATKIN
Keyword(s):  
Photonic Crystals ◽  
Plasma Etching ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Visible Region ◽  
Two Dimensional ◽  
Porous Structures ◽  
Ordered Structure ◽  
Anodic Etching ◽  
Ordered Porous

Photonic crystals are the very promising novel materials for micro- and nanophotonics for visible region. To produce photonic crystals for this region of light, artificial structures with characteristic sizes less than 1 μm have to be manufactured. Electrochemical deep anodic etching and plasma etching techniques is normally used to produce such structures in silicon wafers. However, standard way of deep anodic etching realization is not suitable for sub-micrometer porous silicon formation. In the present work combination of the deep anodic etching and focused ion beam techniques is used to produce ordered structure of macropores in silicon.

scholarly journals Realization of two-dimensional air-bridge silicon photonic crystals by focused ion beam, milling and nanopolishing

2006 ◽  
Author(s):  
Wico C. L. Hopman ◽  
René M. de Ridder ◽  
Shankar Selvaraja ◽  
Cazimir G. Bostan ◽  
Vishwas J. Gadgil ◽  
...  
Keyword(s):  
Photonic Crystals ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Two Dimensional ◽  
Silicon Photonic ◽  
Focused Ion Beam Milling

Application of FIB Circuit Edit in Analysis of Memory Failure of SOI Devices

2006 ◽  
Author(s):  
Z. G. Song ◽  
S. K. Loh ◽  
X. H. Zheng ◽  
S.P. Neo ◽  
C. K. Oh
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Electrical Characterization ◽  
Silicon On Insulator ◽  
First Case ◽  
Edx Analyses ◽  
Memory Failure ◽  
Soi Devices ◽  
Voltage Contrast ◽  
Soi Technology

Abstract This article presents two cases to demonstrate the application of focused ion beam (FIB) circuit edit in analysis of memory failure of silicon on insulator (SOI) devices using XTEM and EDX analyses. The first case was a single bit failure of SRAM units manufactured with 90 nm technology in SOI wafer. The second case was the whole column failure with a single bit pass for a SRAM unit. From the results, it was concluded that FIB circuit edit and electrical characterization is a good methodology for further narrowing down the defective location of memory failure, especially for SOI technology, where contact-level passive voltage contrast is not suitable.

Solving the Voltage Contrast on Floating Substrate with Standard FA Toolset

2016 ◽  
Author(s):  
Julien Goxe ◽  
Béatrice Vanhuffel ◽  
Marie Castignolles ◽  
Thomas Zirilli
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Sample Preparation ◽  
Failure Analysis ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Silicon On Insulator ◽  
Mixed Signal ◽  
Voltage Contrast ◽  
Scanning Electron

Abstract Passive Voltage Contrast (PVC) in a Scanning Electron Microscope (SEM) or a Focused Ion Beam (FIB) is a key Failure Analysis (FA) technique to highlight a leaky gate. The introduction of Silicon On Insulator (SOI) substrate in our recent automotive analog mixed-signal technology highlighted a new challenge: the Bottom Oxide (BOX) layer, by isolating the Silicon Active Area from the bulk made PVC technique less effective in finding leaky MOSFET gates. A solution involving sample preparation performed with standard FA toolset is proposed to enhance PVC on SOI substrate.

Two-dimensional ordered growth of InAs nanowires assisted by randomly deposited silver nanoparticles on a topographically modified surface by a focused ion beam

2019 ◽  
Vol 493 ◽  
pp. 271-278
Author(s):  
R. Ribeiro-Andrade ◽  
T.L. Vasconcelos ◽  
R.M.S. Kawabata ◽  
M.P. Pires ◽  
P.L. Souza ◽  
...  
Keyword(s):  
Silver Nanoparticles ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Two Dimensional ◽  
Inas Nanowires ◽  
Modified Surface

Deeply etched two-dimensional photonic crystals fabricated on GaAs/AlGaAs slab waveguides by using chemically assisted ion beam etching

2002 ◽  
Vol 61-62 ◽  
pp. 875-880 ◽  
Author(s):  
K. Avary ◽  
J.P. Reithmaier ◽  
F. Klopf ◽  
T. Happ ◽  
M. Kamp ◽  
...  
Keyword(s):  
Photonic Crystals ◽  
Ion Beam ◽  
Two Dimensional ◽  
Ion Beam Etching ◽  
Slab Waveguides
Sign in / Sign up

Export Citation Format

Share Document