Patchwork field emission properties of lanthanum monosulfide thin films

V. Semet; M. Cahay; Vu Thien Binh; S. Fairchild; X. Wu; D. J. Lockwood

doi:10.1116/1.2354161

Patchwork field emission properties of lanthanum monosulfide thin films

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.2354161 ◽

2006 ◽

Vol 24 (5) ◽

pp. 2412 ◽

Cited By ~ 16

Author(s):

V. Semet ◽

M. Cahay ◽

Vu Thien Binh ◽

S. Fairchild ◽

X. Wu ◽

...

Keyword(s):

Thin Films ◽

Field Emission ◽

Emission Properties ◽

Field Emission Properties ◽

Lanthanum Monosulfide

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Field emission properties of diamond thin films

9th International Vacuum Microelectronics Conference ◽

10.1109/ivmc.1996.601915 ◽

1996 ◽

Author(s):

R.Z. Bakhtizin ◽

Yu.M. Yamaguzing ◽

S.A. Pshenichnyuk

Keyword(s):

Thin Films ◽

Field Emission ◽

Emission Properties ◽

Field Emission Properties ◽

Diamond Thin Films

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Effects of applying stress on the electron field emission properties in amorphous carbon thin films

Applied Physics Letters ◽

10.1063/1.1940129 ◽

2005 ◽

Vol 86 (23) ◽

pp. 232102 ◽

Cited By ~ 9

Author(s):

C. H. P. Poa ◽

S. R. P. Silva ◽

R. G. Lacerda ◽

G. A. J. Amaratunga ◽

W. I. Milne ◽

...

Keyword(s):

Thin Films ◽

Field Emission ◽

Amorphous Carbon ◽

Electron Field Emission ◽

Emission Properties ◽

Field Emission Properties ◽

Electron Field ◽

Carbon Thin Films ◽

Electron Field Emission Properties

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Field emission properties of lanthanum sulfide thin films deposited on Si and InP substrates by pulsed laser deposition

Technical Digest of the 17th International Vacuum Nanoelectronics Conference (IEEE Cat. No.04TH8737) ◽

10.1109/ivnc.2005.1619546 ◽

2006 ◽

Author(s):

M. Cahay ◽

V. Semet ◽

Vu Thien Binh ◽

S. Fairchild ◽

X. Wu ◽

...

Keyword(s):

Thin Films ◽

Pulsed Laser Deposition ◽

Field Emission ◽

Pulsed Laser ◽

Laser Deposition ◽

Emission Properties ◽

Field Emission Properties ◽

Lanthanum Sulfide ◽

Inp Substrates

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Tailoring of the field emission properties of hydrogenated amorphous carbon thin films by nitrogen incorporation and thermal annealing

Diamond and Related Materials ◽

10.1016/s0925-9635(99)00303-9 ◽

2000 ◽

Vol 9 (3-6) ◽

pp. 1205-1208 ◽

Cited By ~ 6

Author(s):

R.D. Forrest ◽

R.U.A. Khan ◽

S.R.P. Silva

Keyword(s):

Thin Films ◽

Thermal Annealing ◽

Field Emission ◽

Amorphous Carbon ◽

Hydrogenated Amorphous Carbon ◽

Emission Properties ◽

Field Emission Properties ◽

Nitrogen Incorporation ◽

Carbon Thin Films ◽

Hydrogenated Amorphous

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Electro-optical characteristics and field-emission properties of reactive DC-sputtered p-CuAlO2+x thin films

Physica B Condensed Matter ◽

10.1016/j.physb.2005.09.022 ◽

2005 ◽

Vol 370 (1-4) ◽

pp. 264-276 ◽

Cited By ~ 38

Author(s):

A.N. Banerjee ◽

C.K. Ghosh ◽

S. Das ◽

K.K. Chattopadhyay

Keyword(s):

Thin Films ◽

Field Emission ◽

Optical Characteristics ◽

Emission Properties ◽

Field Emission Properties

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Field emission properties of amorphous carbon nitride thin films prepared by arc ion plating

Surface and Coatings Technology ◽

10.1016/s0257-8972(01)01255-5 ◽

2001 ◽

Vol 142-144 ◽

pp. 714-718 ◽

Cited By ~ 7

Author(s):

Hiroyuki Sugimura ◽

Yoshiki Sato ◽

Nobuhiro Tajima ◽

Osamu Takai

Keyword(s):

Thin Films ◽

Field Emission ◽

Amorphous Carbon ◽

Carbon Nitride ◽

Arc Ion Plating ◽

Emission Properties ◽

Ion Plating ◽

Field Emission Properties ◽

Amorphous Carbon Nitride

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Pulsed laser deposition of lanthanum sulfide thin films on silicon and indium phosphide substrates: growth, characterization, and field emission properties

Technical Digest of the 17th International Vacuum Nanoelectronics Conference (IEEE Cat. No.04TH8737) ◽

10.1109/ivnc.2004.1355008 ◽

2004 ◽

Author(s):

M. Cahay ◽

K. Garre ◽

P. Draviam ◽

P. Boolchand ◽

S. Fairchild ◽

...

Keyword(s):

Thin Films ◽

Indium Phosphide ◽

Pulsed Laser Deposition ◽

Field Emission ◽

Pulsed Laser ◽

Laser Deposition ◽

Emission Properties ◽

Field Emission Properties ◽

Growth Characterization ◽

Lanthanum Sulfide

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Influence of sp2 clusters on the field emission properties of amorphous carbon thin films

Applied Physics Letters ◽

10.1063/1.1312202 ◽

2000 ◽

Vol 77 (13) ◽

pp. 2006-2008 ◽

Cited By ~ 69

Author(s):

J. D. Carey ◽

R. D. Forrest ◽

R. U. A. Khan ◽

S. R. P. Silva

Keyword(s):

Thin Films ◽

Field Emission ◽

Amorphous Carbon ◽

Emission Properties ◽

Field Emission Properties ◽

Carbon Thin Films

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Effect of particle size and inter-electrode distance on the field-emission properties of nanocrystalline CdS thin films grown in a polymer matrix by chemical bath deposition

Physica E Low-dimensional Systems and Nanostructures ◽

10.1016/j.physe.2006.07.029 ◽

2006 ◽

Vol 35 (1) ◽

pp. 178-182 ◽

Cited By ~ 19

Author(s):

P.K. Ghosh ◽

S. Jana ◽

U.N. Maity ◽

K.K. Chattopadhyay

Keyword(s):

Thin Films ◽

Particle Size ◽

Field Emission ◽

Chemical Bath Deposition ◽

Polymer Matrix ◽

Emission Properties ◽

Field Emission Properties ◽

Electrode Distance ◽

Cds Thin Films ◽

Effect Of Particle Size

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Correlation between surface chemistry, gasochromism and field emission properties of tungsten oxide nanowire thin films when exposed to atomic oxygen

RSC Advances ◽

10.1039/c5ra12457c ◽

2015 ◽

Vol 5 (86) ◽

pp. 70059-70063 ◽

Cited By ~ 5

Author(s):

C. X. Zhao ◽

S. Z. Deng ◽

N. S. Xu ◽

Jun Chen

Keyword(s):

Thin Films ◽

Surface Chemistry ◽

Tungsten Oxide ◽

Field Emission ◽

Atomic Oxygen ◽

Chemical State ◽

Emission Characteristics ◽

Emission Properties ◽

Field Emission Properties ◽

Atomic Oxygen Exposure

Effects of atomic oxygen exposure on gasochromism, chemical state and field emission properties of W20O58 nanowires have been investigated. We attempt to unvelling the origin for better understanding of the observed field emission characteristics.

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