Optical diagnostics for plasma-surface interaction in CF4∕Ar radio-frequency inductively coupled plasma during Si and SiO2 etching

2006 ◽  
Vol 24 (5) ◽  
pp. 1718-1724 ◽  
Author(s):  
Y. Miyoshi ◽  
M. Miyauchi ◽  
A. Oguni ◽  
T. Makabe
Keyword(s):  
Radio Frequency ◽  
Inductively Coupled Plasma ◽  
Optical Diagnostics ◽  
Surface Interaction ◽  
Plasma Surface ◽  
Inductively Coupled ◽  
Sio2 Etching

Comparison of external and internal planar radio frequency antennae for inductively coupled plasma

1997 ◽  
Vol 68 (6) ◽  
pp. 2381-2383 ◽  
Author(s):  
K. Eng ◽  
K. Strohmaier ◽  
R. Palmer ◽  
B. Stoner ◽  
S. Washburn
Keyword(s):  
Radio Frequency ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled

CVD of hard DLC films in a radio frequency inductively coupled plasma source

2001 ◽  
Vol 390 (1-2) ◽  
pp. 98-103 ◽  
Author(s):  
S.J Yu ◽  
Z.F Ding ◽  
J Xu ◽  
J.L Zhang ◽  
T.C Ma
Keyword(s):  
Radio Frequency ◽  
Inductively Coupled Plasma ◽  
Plasma Source ◽  
Inductively Coupled
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