scholarly journals High reflectance of reflective-type attenuated-phase-shifting masks for extreme ultraviolet lithography with high inspection contrast in deep ultraviolet regimes

2004 ◽  
Vol 22 (6) ◽  
pp. 3049 ◽  
Author(s):  
H. L. Chen ◽  
H. C. Cheng ◽  
T. S. Ko ◽  
F. H. Ko ◽  
T. C. Chu
Keyword(s):  
Extreme Ultraviolet ◽  
Phase Shifting ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Deep Ultraviolet ◽  
High Reflectance

Deep ultraviolet out-of-band contribution in extreme ultraviolet lithography: predictions and experiments

2011 ◽  
Author(s):  
Gian F. Lorusso ◽  
Natalia Davydova ◽  
Mark Eurlings ◽  
Cemil Kaya ◽  
Yue Peng ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Deep Ultraviolet

scholarly journals Coherent diffractive imaging methods for semiconductor manufacturing

2017 ◽  
Vol 6 (6) ◽  
Author(s):  
Patrick Helfenstein ◽  
Iacopo Mochi ◽  
Rajendran Rajeev ◽  
Sara Fernandez ◽  
Yasin Ekinci
Keyword(s):  
Extreme Ultraviolet ◽  
Imaging Techniques ◽  
Semiconductor Industry ◽  
Extreme Ultraviolet Lithography ◽  
Lensless Imaging ◽  
Diffractive Imaging ◽  
Ultraviolet Lithography ◽  
Coherent Diffractive Imaging ◽  
Cost Of Ownership ◽  
Deep Ultraviolet

AbstractThe paradigm shift of the semiconductor industry moving from deep ultraviolet to extreme ultraviolet lithography (EUVL) brought about new challenges in the fabrication of illumination and projection optics, which constitute one of the core sources of cost of ownership for many of the metrology tools needed in the lithography process. For this reason, lensless imaging techniques based on coherent diffractive imaging started to raise interest in the EUVL community. This paper presents an overview of currently on-going research endeavors that use a number of methods based on lensless imaging with coherent light.

Mask-induced best-focus shifts in deep ultraviolet and extreme ultraviolet lithography

2016 ◽  
Vol 15 (2) ◽  
pp. 021205 ◽  
Author(s):  
Andreas Erdmann ◽  
Peter Evanschitzky ◽  
Jens Timo Neumann ◽  
Paul Gräupner
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Deep Ultraviolet
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