Deep ultraviolet out-of-band contribution in extreme ultraviolet lithography: predictions and experiments

2011 ◽  
Author(s):  
Gian F. Lorusso ◽  
Natalia Davydova ◽  
Mark Eurlings ◽  
Cemil Kaya ◽  
Yue Peng ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Deep Ultraviolet

scholarly journals Coherent diffractive imaging methods for semiconductor manufacturing

2017 ◽  
Vol 6 (6) ◽  
Author(s):  
Patrick Helfenstein ◽  
Iacopo Mochi ◽  
Rajendran Rajeev ◽  
Sara Fernandez ◽  
Yasin Ekinci
Keyword(s):  
Extreme Ultraviolet ◽  
Imaging Techniques ◽  
Semiconductor Industry ◽  
Extreme Ultraviolet Lithography ◽  
Lensless Imaging ◽  
Diffractive Imaging ◽  
Ultraviolet Lithography ◽  
Coherent Diffractive Imaging ◽  
Cost Of Ownership ◽  
Deep Ultraviolet

AbstractThe paradigm shift of the semiconductor industry moving from deep ultraviolet to extreme ultraviolet lithography (EUVL) brought about new challenges in the fabrication of illumination and projection optics, which constitute one of the core sources of cost of ownership for many of the metrology tools needed in the lithography process. For this reason, lensless imaging techniques based on coherent diffractive imaging started to raise interest in the EUVL community. This paper presents an overview of currently on-going research endeavors that use a number of methods based on lensless imaging with coherent light.

Mask-induced best-focus shifts in deep ultraviolet and extreme ultraviolet lithography

2016 ◽  
Vol 15 (2) ◽  
pp. 021205 ◽  
Author(s):  
Andreas Erdmann ◽  
Peter Evanschitzky ◽  
Jens Timo Neumann ◽  
Paul Gräupner
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Deep Ultraviolet

Backbone Degradable Poly(aryl acetal) Photoresist Polymers: Synthesis, Acid Sensitivity, and Extreme Ultraviolet Lithography Performance

2019 ◽  
Vol 52 (3) ◽  
pp. 886-895 ◽  
Author(s):  
Matthias S. Ober ◽  
Duane R. Romer ◽  
John Etienne ◽  
P. J. Thomas ◽  
Vipul Jain ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Acid Sensitivity

Demonstration of phase-shift masks for extreme-ultraviolet lithography

2006 ◽  
Author(s):  
Bruno La Fontaine ◽  
Adam R. Pawloski ◽  
Obert Wood ◽  
Yunfei Deng ◽  
Harry J. Levinson ◽  
...  
Keyword(s):  
Phase Shift ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography

Influence of MEEF change on the mask shadowing effect in extreme ultraviolet lithography

2010 ◽  
Vol 87 (11) ◽  
pp. 2134-2138 ◽  
Author(s):  
Chang Young Jeong ◽  
Sangsul Lee ◽  
Hyun-Duck Shin ◽  
Tae Geun Kim ◽  
Jinho Ahn
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Shadowing Effect

Laser Shock Removal of Nanoparticles from Si Capping Layer of Extreme Ultraviolet Lithography Masks

2005 ◽  
Vol 44 (7B) ◽  
pp. 5560-5564 ◽  
Author(s):  
Sang-Ho Lee ◽  
Young-Jae Kang ◽  
Jin-Goo Park ◽  
Ahmed A. Busnaina ◽  
Jong-Myung Lee ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Laser Shock ◽  
Ultraviolet Lithography ◽  
Capping Layer
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