Advances in the reduction and compensation of film stress in high-reflectance multilayer coatings for extreme-ultraviolet lithography

1998 ◽  
Author(s):  
Paul B. Mirkarimi ◽  
Claude Montcalm
Keyword(s):  
Extreme Ultraviolet ◽  
Film Stress ◽  
Multilayer Coatings ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
High Reflectance

Sub-diffraction-limited multilayer coatings for the 03 numerical aperture micro-exposure tool for extreme ultraviolet lithography

2007 ◽  
Vol 46 (18) ◽  
pp. 3736 ◽  
Author(s):  
Regina Soufli ◽  
Russell M. Hudyma ◽  
Eberhard Spiller ◽  
Eric M. Gullikson ◽  
Mark A. Schmidt ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Numerical Aperture ◽  
Multilayer Coatings ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography

scholarly journals High-precision reflectometry of multilayer coatings for extreme ultraviolet lithography

2000 ◽  
Author(s):  
Marco Wedowski ◽  
James H. Underwood ◽  
Eric M. Gullikson ◽  
Sasa Bajt ◽  
James A. Folta ◽  
...  
Keyword(s):  
High Precision ◽  
Extreme Ultraviolet ◽  
Multilayer Coatings ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography

scholarly journals Lifetime studies of Mo/Si and Mo/Be multilayer coatings for extreme ultraviolet lithography

1999 ◽  
Author(s):  
Marco Wedowski ◽  
Sasa Bajt ◽  
James A. Folta ◽  
Eric M. Gullikson ◽  
Ulf Kleineberg ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Multilayer Coatings ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Lifetime Studies

Low-Stress Molybdenum/Silicon Multilayer Coatings for Extreme Ultraviolet Lithography

2000 ◽  
Vol 39 (Part 1, No. 12B) ◽  
pp. 6810-6814 ◽  
Author(s):  
Masayuki Shiraishi ◽  
Wakana Ishiyama ◽  
Tetsuya Oshino ◽  
Katsuhiko Murakami
Keyword(s):  
Extreme Ultraviolet ◽  
Multilayer Coatings ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography
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