Preparation and characterization of high-quality TiN films at low temperature by filtered cathode arc plasma

2004 ◽  
Vol 22 (6) ◽  
pp. 2419-2423 ◽  
Author(s):  
Y. J. Zhang ◽  
P. X. Yan ◽  
Z. G. Wu ◽  
J. W. Xu ◽  
W. W. Zhang ◽  
...  
1994 ◽  
Vol 34 (1-4) ◽  
pp. 549-555 ◽  
Author(s):  
S. Nonomura ◽  
T. Nishiwaki ◽  
E. Nishimura ◽  
S. Hasegawa ◽  
T. Itoh ◽  
...  

1987 ◽  
Vol 102 ◽  
Author(s):  
T. H. Chiu ◽  
E. F. Schubert ◽  
J. E. Cunningham ◽  
W. T. Tsang ◽  
B. Tell

ABSTRACTHigh quality GaAs layers have been grown by chemical beam epitaxy using triethylgallium and arsine. Undoped GaAs epilayer with net acceptor concentration NA - ND = 3}10 14cm-3 has been obtained at a low growth temperature of 500°C. Si dopant diffusion at such low temperature during growth is negligible. Using monolayer doping technique epilayers with Si impurities localized in a 2-dimensional plane were prepared. Capacitance-voltage profiling showed a high sheet electron concentration of lx1013cm-2 and peak widths of 22Å and 18Å at 300K and 77K, respectively, which are the narrowest ever reported. For samples grown or annealed at higher temperatures, significant impurity diffusion was observed.


RSC Advances ◽  
2015 ◽  
Vol 5 (81) ◽  
pp. 66086-66095 ◽  
Author(s):  
Qiang Wang ◽  
Qingjun Guo ◽  
Bing Li

High-quality substitutional Na-modified K2Ti6O13 nanobelts with improved photocatalytic activity were synthesized efficiently from NaCl–KCl melts below 700 °C.


2002 ◽  
Vol 240 (3-4) ◽  
pp. 513-520 ◽  
Author(s):  
H.H. Huang ◽  
M.H. Hon ◽  
M.C. Wang

2015 ◽  
Vol 135 (7) ◽  
pp. 733-738 ◽  
Author(s):  
Yasushi Kobayashi ◽  
Yoshihiro Nakata ◽  
Tomoji Nakamura ◽  
Mayumi B. Takeyama ◽  
Masaru Sato ◽  
...  
Keyword(s):  

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