Interpretation of stress variation in silicon nitride films deposited by electron cyclotron resonance plasma

M. P. Besland; M. Lapeyrade; F. Delmotte; G. Hollinger

doi:10.1116/1.1776179

Interpretation of stress variation in silicon nitride films deposited by electron cyclotron resonance plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1776179 ◽

2004 ◽

Vol 22 (5) ◽

pp. 1962-1970 ◽

Cited By ~ 15

Author(s):

M. P. Besland ◽

M. Lapeyrade ◽

F. Delmotte ◽

G. Hollinger

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Stress Variation ◽

Electron Cyclotron Resonance Plasma ◽

Silicon Nitride Films ◽

Resonance Plasma

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Ion-assisted deposition of silicon nitride films using electron cyclotron resonance plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1371323 ◽

2001 ◽

Vol 19 (4) ◽

pp. 1336-1340 ◽

Cited By ~ 12

Author(s):

K. Deenamma Vargheese ◽

G. Mohan Rao

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Silicon Nitride Films ◽

Resonance Plasma

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Characterization of nitrogen-rich silicon nitride films grown by the electron cyclotron resonance plasma technique

Semiconductor Science and Technology ◽

10.1088/0268-1242/18/7/306 ◽

2003 ◽

Vol 18 (7) ◽

pp. 633-641 ◽

Cited By ~ 16

Author(s):

L Wang ◽

H S Reehal ◽

F L Mart nez ◽

E San Andr s ◽

A del Prado

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Technique ◽

Silicon Nitride Films ◽

Resonance Plasma

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Silicon nitride films deposited at substrate temperatures <100 °C in a permanent magnet electron cyclotron resonance plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.582103 ◽

1999 ◽

Vol 17 (5) ◽

pp. 2612-2618 ◽

Cited By ~ 30

Author(s):

C. Doughty ◽

D. C. Knick ◽

J. B. Bailey ◽

J. E. Spencer

Keyword(s):

Silicon Nitride ◽

Permanent Magnet ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Silicon Nitride Films ◽

Substrate Temperatures ◽

Resonance Plasma

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Silicon nitride deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposititon for micromachining applications

10.1117/12.324050 ◽

1998 ◽

Author(s):

Roberto R. Panepucci ◽

Jose A. Diniz ◽

Eduardo Carli ◽

Peter J. Tatschi ◽

Jacobus W. Swart

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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I‐Vcharacteristics of electron‐cyclotron‐resonance plasma‐enhanced chemical‐vapor‐deposition silicon nitride thin films

Journal of Applied Physics ◽

10.1063/1.356455 ◽

1994 ◽

Vol 75 (2) ◽

pp. 979-984 ◽

Cited By ~ 26

Author(s):

Yoo‐Chan Jeon ◽

Ho‐Young Lee ◽

Seung‐Ki Joo

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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On the silicon nitride film formation from N/sub 2/-SiH/sub 4/ electron cyclotron resonance plasma

IEEE Conference Record - Abstracts. 1992 IEEE International Conference on Plasma ◽

10.1109/plasma.1992.697984 ◽

2005 ◽

Author(s):

Sun-Kyu Song ◽

Hong-young Chang

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Film Formation ◽

Electron Cyclotron ◽

Nitride Film ◽

Silicon Nitride Film ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Electron cyclotron resonance plasma deposition and etching of silicon nitride on GaSb for optoelectronic applications

Materials Science and Engineering B ◽

10.1016/0921-5107(94)90085-x ◽

1994 ◽

Vol 28 (1-3) ◽

pp. 369-373

Author(s):

R. Bonnot ◽

A. Gouskov ◽

G. Bougnot

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Optoelectronic Applications ◽

Resonance Plasma

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Room Temperature Deposition of Silicon Nitride Films for Passivation of Organic Electroluminescence Device Using a Sputtering-Type Electron Cyclotron Resonance Plasma

Japanese Journal of Applied Physics ◽

10.1143/jjap.38.4868 ◽

1999 ◽

Vol 38 (Part 1, No. 8) ◽

pp. 4868-4871 ◽

Cited By ~ 3

Author(s):

Dawei Gao ◽

Katsuhiko Furukawa ◽

Hiroshi Nakashima ◽

Junsi Gao ◽

Junli Wang ◽

...

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Room Temperature ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Organic Electroluminescence ◽

Silicon Nitride Films ◽

Electroluminescence Device ◽

Temperature Deposition ◽

Resonance Plasma

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ChemInform Abstract: The Characterization of Electron Cyclotron Resonance Plasma Deposited Silicon Nitride and Silicon Oxide Films

ChemInform ◽

10.1002/chin.199002353 ◽

1990 ◽

Vol 21 (2) ◽

Author(s):

NGUYEN SON VAN NGUYEN SON VAN ◽

K. ALBAUGH

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Silicon Oxide ◽

Electron Cyclotron Resonance ◽

Oxide Films ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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On the silicon nitride film formation from N/sub 2/-SiH/sub 4/ electron cyclotron resonance plasma

International Conference on Plasma Sciences (ICOPS) ◽

10.1109/plasma.1993.593093 ◽

1993 ◽

Author(s):

Y.-J. Kim ◽

J.-H. Kim ◽

S.-K. Song ◽

H.-Y. Chang

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Film Formation ◽

Electron Cyclotron ◽

Nitride Film ◽

Silicon Nitride Film ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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