Structural characterization of nanocomposite Ti–Si–N coatings prepared by pulsed dc plasma-enhanced chemical vapor deposition

Shengli Ma; Dayan Ma; Kewei Xu; Wanqi Jie

doi:10.1116/1.1763593

Structural characterization of nanocomposite Ti–Si–N coatings prepared by pulsed dc plasma-enhanced chemical vapor deposition

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1763593 ◽

2004 ◽

Vol 22 (4) ◽

pp. 1694 ◽

Cited By ~ 8

Author(s):

Shengli Ma ◽

Dayan Ma ◽

Kewei Xu ◽

Wanqi Jie

Keyword(s):

Chemical Vapor Deposition ◽

Structural Characterization ◽

Vapor Deposition ◽

Chemical Vapor ◽

Dc Plasma ◽

Pulsed Dc

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Plasma-enhanced chemical vapor deposition and structural characterization of amorphous chalcogenide films

Semiconductors ◽

10.1134/1.1187472 ◽

1998 ◽

Vol 32 (8) ◽

pp. 855-860 ◽

Cited By ~ 11

Author(s):

P. Nagels

Keyword(s):

Chemical Vapor Deposition ◽

Structural Characterization ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chalcogenide Films ◽

Amorphous Chalcogenide

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Application of Hard Coatings Processed by Pulsed DC Plasma-Enhanced Chemical Vapor Deposition to Dies and Molds

Journal of the Japan Society for Technology of Plasticity ◽

10.9773/sosei.50.625 ◽

2015 ◽

Vol 50 (582) ◽

pp. 625-629

Author(s):

Kazuki KAWADA

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Hard Coatings ◽

Dc Plasma ◽

Pulsed Dc

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Structural characterization of InN films grown on different buffer layers by metalorganic chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/j.jcrysgro.2007.05.052 ◽

2007 ◽

Vol 306 (2) ◽

pp. 292-296 ◽

Cited By ~ 13

Author(s):

X.L. Zhu ◽

L.W. Guo ◽

N.S. Yu ◽

J.F. Yan ◽

M.Z. Peng ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Structural Characterization ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Buffer Layers ◽

Metalorganic Chemical

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Structural characterization of aluminum films deposited on sputtered‐titanium nitride/silicon substrate by metalorganic chemical vapor deposition from dimethylethylamine alane

Applied Physics Letters ◽

10.1063/1.115268 ◽

1995 ◽

Vol 67 (23) ◽

pp. 3426-3428 ◽

Cited By ~ 11

Author(s):

Xiaodong Li ◽

Byoung‐Youp Kim ◽

Shi‐Woo Rhee

Keyword(s):

Chemical Vapor Deposition ◽

Structural Characterization ◽

Vapor Deposition ◽

Silicon Substrate ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Aluminum Films ◽

Dimethylethylamine Alane ◽

Metalorganic Chemical

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Formation and structural characterization of nanocrystalline Si/SiC multilayers grown by hot filament assisted chemical vapor deposition using CH3SiH3 gas jets

Thin Solid Films ◽

10.1016/j.tsf.2009.10.127 ◽

2010 ◽

Vol 518 (14) ◽

pp. 3759-3762 ◽

Cited By ~ 3

Author(s):

Yoshifumi Ikoma ◽

Ryousuke Okuyama ◽

Makoto Arita ◽

Teruaki Motooka

Keyword(s):

Chemical Vapor Deposition ◽

Structural Characterization ◽

Vapor Deposition ◽

Chemical Vapor ◽

Gas Jets ◽

Hot Filament ◽

Nanocrystalline Si

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Structural Characterization of HfNx-based Films Grown by Metal Organic Chemical Vapor Deposition

Metals and Materials International ◽

10.3365/met.mat.2008.02.099 ◽

2008 ◽

Vol 14 (1) ◽

pp. 99-103 ◽

Cited By ~ 1

Author(s):

Chang Chun Chen

Keyword(s):

Chemical Vapor Deposition ◽

Structural Characterization ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Deposition and structural characterization of poly-Si thin films on Al-coated glass substrates using hot-wire chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(03)00088-9 ◽

2003 ◽

Vol 430 (1-2) ◽

pp. 120-124 ◽

Cited By ~ 9

Author(s):

Ozgenc Ebil ◽

Roger Aparicio ◽

Sukti Hazra ◽

Robert W. Birkmire ◽

Eli Sutter

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Structural Characterization ◽

Vapor Deposition ◽

Chemical Vapor ◽

Hot Wire ◽

Coated Glass ◽

Glass Substrates

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Deposition and structural characterization of ZrO2 and yttria-stabilized ZrO2 films by chemical vapor deposition

Thin Solid Films ◽

10.1016/0040-6090(94)06274-o ◽

1995 ◽

Vol 254 (1-2) ◽

pp. 33-38 ◽

Cited By ~ 74

Author(s):

J.S. Kim ◽

H.A. Marzouk ◽

P.J. Reucroft

Keyword(s):

Chemical Vapor Deposition ◽

Structural Characterization ◽

Vapor Deposition ◽

Chemical Vapor

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Influences of Initial Nitridation Process on the Optical and Structural Characterization of GaN Layer Grown on Sapphire (0001) by Metalorganic Chemical Vapor Deposition

phys stat sol (a) ◽

10.1002/1521-396x(200112)188:2<653::aid-pssa653>3.0.co;2-b ◽

2001 ◽

Vol 188 (2) ◽

pp. 653-657 ◽

Cited By ~ 1

Author(s):

X.L. Sun ◽

Hui Yang ◽

J.J. Zhu ◽

Y.T. Wang ◽

Y. Chen ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Structural Characterization ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Nitridation Process ◽

Metalorganic Chemical

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Preparation and structural characterization of, and chemical vapor deposition studies with, certain yttrium tris(β-diketonate) compounds

Chemical Vapor Deposition ◽

10.1002/cvde.19960020405 ◽

1996 ◽

Vol 2 (4) ◽

pp. 149-161 ◽

Cited By ~ 30

Author(s):

Henry A. Luten ◽

William S. Rees ◽

Virgil L. Goedken

Keyword(s):

Chemical Vapor Deposition ◽

Structural Characterization ◽

Vapor Deposition ◽

Chemical Vapor

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