scholarly journals Spectroscopic study of debris mitigation with minimum-mass Sn laser plasma for extreme ultraviolet lithography

2006 ◽  
Vol 88 (17) ◽  
pp. 171503 ◽  
Author(s):  
S. Namba ◽  
S. Fujioka ◽  
H. Nishimura ◽  
Y. Yasuda ◽  
K. Nagai ◽  
...  
Keyword(s):  
Spectroscopic Study ◽  
Laser Plasma ◽  
Extreme Ultraviolet ◽  
Minimum Mass ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Debris Mitigation

Dynamics of Mass-Limited Laser Plasma Targets as Sources for Extreme Ultraviolet Lithography

2002 ◽  
Vol 41 (Part 1, No. 6B) ◽  
pp. 4070-4073 ◽  
Author(s):  
Christian Keyser ◽  
Robert Bernath ◽  
Moza Al-Rabban ◽  
Martin Richardson
Keyword(s):  
Laser Plasma ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography

Backbone Degradable Poly(aryl acetal) Photoresist Polymers: Synthesis, Acid Sensitivity, and Extreme Ultraviolet Lithography Performance

2019 ◽  
Vol 52 (3) ◽  
pp. 886-895 ◽  
Author(s):  
Matthias S. Ober ◽  
Duane R. Romer ◽  
John Etienne ◽  
P. J. Thomas ◽  
Vipul Jain ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Acid Sensitivity
Sign in / Sign up

Export Citation Format

Share Document