Electrical properties of SiO[sub 2] films with embedded nanoparticles formed by SiH[sub 4]/O[sub 2] chemical vapor deposition
2003 ◽
Vol 21
(6)
◽
pp. 2441
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1993 ◽
Vol 132
(3-4)
◽
pp. 414-418
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2005 ◽
Vol 8
(1-3)
◽
pp. 125-129
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Keyword(s):
Keyword(s):
2006 ◽
Vol 6
(11)
◽
pp. 3479-3482
1996 ◽
Vol 35
(Part 1, No. 12B)
◽
pp. 6562-6565
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Keyword(s):