Enhancement of the Electrical Properties of Graphene Grown by Chemical Vapor Deposition via Controlling the Effects of Polymer Residue

Ji Won Suk; Wi Hyoung Lee; Jongho Lee; Harry Chou; Richard D. Piner; Yufeng Hao; Deji Akinwande; Rodney S. Ruoff

doi:10.1021/nl304420b

Enhancement of the Electrical Properties of Graphene Grown by Chemical Vapor Deposition via Controlling the Effects of Polymer Residue

Nano Letters ◽

10.1021/nl304420b ◽

2013 ◽

Vol 13 (4) ◽

pp. 1462-1467 ◽

Cited By ~ 251

Author(s):

Ji Won Suk ◽

Wi Hyoung Lee ◽

Jongho Lee ◽

Harry Chou ◽

Richard D. Piner ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Electrical Properties ◽

Vapor Deposition ◽

Chemical Vapor

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Electrical Properties of 10-50 nm TEOS (Tetraethoxysilane) LPCVD (Low Pressure Chemical Vapor Deposition) Films.

10.21236/ada146416 ◽

1984 ◽

Author(s):

R. H. Vogel ◽

S. R. Butler ◽

F. J. Feigl

Keyword(s):

Chemical Vapor Deposition ◽

Electrical Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Pressure Chemical

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Structural and electrical properties of BaTiO3thin films grown onp‐InSb substrate by metalorganic chemical vapor deposition at low temperature

Applied Physics Letters ◽

10.1063/1.109550 ◽

1993 ◽

Vol 62 (15) ◽

pp. 1788-1790 ◽

Cited By ~ 16

Author(s):

T. W. Kim ◽

M. Jung ◽

H. J. Kim ◽

Y. S. Yoon ◽

W. N. Kang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Electrical Properties ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Structural And Electrical Properties ◽

Metalorganic Chemical

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Electrical properties of GaP on Si grown by metalorganic chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/0022-0248(93)90066-6 ◽

1993 ◽

Vol 132 (3-4) ◽

pp. 414-418 ◽

Cited By ~ 2

Author(s):

T. Soga ◽

T. Suzuki ◽

M. Mori ◽

Z.K. Jiang ◽

T. Jimbo ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Electrical Properties ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metalorganic Chemical

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Electrical properties of W delta doped Si epitaxial films grown on Si(100) by ultraclean low-pressure chemical vapor deposition

Materials Science in Semiconductor Processing ◽

10.1016/j.mssp.2004.09.025 ◽

2005 ◽

Vol 8 (1-3) ◽

pp. 125-129 ◽

Cited By ~ 1

Author(s):

Takehisa Kurosawa ◽

Tomoyuki Komatsu ◽

Masao Sakuraba ◽

Junichi Murota

Keyword(s):

Chemical Vapor Deposition ◽

Electrical Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Epitaxial Films ◽

Pressure Chemical

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Low pressure chemical vapor deposition of oxide from SiH4/O2: Chemistry and effects on electrical properties

Applied Physics Letters ◽

10.1063/1.106962 ◽

1992 ◽

Vol 60 (2) ◽

pp. 198-200 ◽

Cited By ~ 26

Author(s):

M. Liehr ◽

S. A. Cohen

Keyword(s):

Chemical Vapor Deposition ◽

Electrical Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Pressure Chemical

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Synthesis and Electrical Properties of (Bi1/2Na1/2)TiO3(BNT) Ferroelectric Thin Films by Liquid Sprayed Mist Chemical Vapor Deposition Technique

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2006.038 ◽

2006 ◽

Vol 6 (11) ◽

pp. 3479-3482

Author(s):

Bok-Hee Kim ◽

Sang-Hee Kim ◽

Jong-Hwan Kim ◽

Kun-Jae Lee ◽

Yong-Ho Choa ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Electrical Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

Ferroelectric Thin Films ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique

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Electrical Properties of Heavily Carbon-Doped GaAs Epilayers Grown by Atmospheric Pressure Metalorganic Chemical Vapor Deposition Using CBr4

Japanese Journal of Applied Physics ◽

10.1143/jjap.35.6562 ◽

1996 ◽

Vol 35 (Part 1, No. 12B) ◽

pp. 6562-6565 ◽

Cited By ~ 4

Author(s):

Chang-Sik Son ◽

Seong-Il Kim ◽

Byung-Don Min ◽

Yong Kim ◽

Eun Kyu Kim ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Electrical Properties ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Carbon Doped ◽

Metalorganic Chemical

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Structural， optical and electrical properties of Ga2（1-x）In2xO3 films prepared by metalorganic chemical vapor deposition

Acta Physica Sinica ◽

10.7498/aps.58.7079 ◽

2009 ◽

Vol 58 (10) ◽

pp. 7079

Author(s):

Yang Fan ◽

Ma Jin ◽

Kong Ling-Yi ◽

Luan Cai-Na ◽

Zhu Zhen

Keyword(s):

Chemical Vapor Deposition ◽

Electrical Properties ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Optical And Electrical Properties ◽

Metalorganic Chemical

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Effect of fluorine on chemical and electrical properties of room temperature oxide films prepared by plasma enhanced chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.121027 ◽

1998 ◽

Vol 72 (10) ◽

pp. 1247-1249 ◽

Cited By ~ 15

Author(s):

Kihong Kim ◽

Juho Song ◽

Daehyuk Kwon ◽

G. S. Lee

Keyword(s):

Chemical Vapor Deposition ◽

Electrical Properties ◽

Vapor Deposition ◽

Room Temperature ◽

Oxide Films ◽

Chemical Vapor ◽

Temperature Oxide

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Effects of SrF2 phase on electrical properties of SrTiO3 thin films deposited by plasma-enhanced metalorganic chemical vapor deposition

Integrated Ferroelectrics ◽

10.1080/10584589708019982 ◽

1997 ◽

Vol 14 (1-4) ◽

pp. 105-113 ◽

Cited By ~ 2

Author(s):

Nam-Kyeong Kim ◽

Soon-Gil Yoon ◽

Won-Jae Lee ◽

Ho-Gi Kim

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Electrical Properties ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metalorganic Chemical

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