Diamond-like carbon films deposited on polyethylene terephthalate substrates by radio frequency plasma chemical vapor deposition method

Ayako Kimura; Hideyuki Kodama; Tetsuya Suzuki

doi:10.1116/1.1537717

Diamond-like carbon films deposited on polyethylene terephthalate substrates by radio frequency plasma chemical vapor deposition method

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1537717 ◽

2003 ◽

Vol 21 (2) ◽

pp. 515-517 ◽

Cited By ~ 13

Author(s):

Ayako Kimura ◽

Hideyuki Kodama ◽

Tetsuya Suzuki

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Chemical Vapor Deposition Method ◽

Diamond Like Carbon ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Frequency Plasma

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Electrical conductive hard-carbon (diamond-like carbon) films formed by i-C4H10/N2 supermagnetron plasma chemical vapor deposition method

Thin Solid Films ◽

10.1016/s0040-6090(00)01091-9 ◽

2000 ◽

Vol 373 (1-2) ◽

pp. 251-254 ◽

Cited By ~ 9

Author(s):

Haruhisa Kinoshita ◽

Jun Takahashi ◽

Takuya Hando

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Chemical Vapor Deposition Method ◽

Diamond Like Carbon ◽

Deposition Method ◽

Hard Carbon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Formation of Carbon Nitride Films by the Radio-Frequency Plasma Chemical Vapor Deposition Method

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.4893 ◽

1997 ◽

Vol 36 (Part 1, No. 7B) ◽

pp. 4893-4896 ◽

Cited By ~ 17

Author(s):

Mei Zhang ◽

Ping Wang ◽

Yoshikazu Nakayama

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Carbon Nitride ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Frequency Plasma

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Selective growth of CNT by using triode-type radio frequency plasma chemical vapor deposition method

Diamond and Related Materials ◽

10.1016/j.diamond.2006.11.066 ◽

2007 ◽

Vol 16 (4-7) ◽

pp. 1106-1109 ◽

Cited By ~ 4

Author(s):

Yoshiyuki Show ◽

Norihiko Fukuzumi

Keyword(s):

Chemical Vapor Deposition ◽

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Frequency Plasma

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Evolution of optical properties with deposition time of silicon nitride and diamond-like carbon films deposited by radio-frequency plasma-enhanced chemical vapor deposition method

Thin Solid Films ◽

10.1016/j.tsf.2011.04.032 ◽

2011 ◽

Vol 519 (19) ◽

pp. 6339-6343 ◽

Cited By ~ 32

Author(s):

Mateusz Smietana ◽

Wojtek J. Bock ◽

Jan Szmidt

Keyword(s):

Optical Properties ◽

Vapor Deposition ◽

Deposition Time ◽

Chemical Vapor ◽

Carbon Films ◽

Chemical Vapor Deposition Method ◽

Diamond Like Carbon ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Frequency Plasma

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Development ofCH4-Radio-Frequency-Plasma-Enhanced Chemical Vapor Deposition Method with a Positively Self-Biased Electrode for Diamond-Like Carbon Film

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.2817 ◽

1997 ◽

Vol 36 (Part 1, No. 5A) ◽

pp. 2817-2821 ◽

Cited By ~ 6

Author(s):

Hiroshi Inaba ◽

Yuuichi Kokaku ◽

Masatomo Terakado ◽

Hiroyuki Kataoka

Keyword(s):

Chemical Vapor Deposition ◽

Radio Frequency ◽

Vapor Deposition ◽

Carbon Film ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Diamond Like Carbon ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Frequency Plasma

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Positive and negative direct current bias effects on the microstructures and physical properties of hydrogenated amorphous carbon films prepared by radio frequency plasma chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579398 ◽

1995 ◽

Vol 13 (2) ◽

pp. 195-199 ◽

Cited By ~ 15

Author(s):

Masatoshi Nakayama ◽

Atsuhiro Tsuyoshi ◽

Masanori Shibahara ◽

Kazunori Maruyama ◽

Kiichiro Kamata

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Radio Frequency Plasma ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Plasma Chemical Vapor Deposition ◽

Direct Current Bias ◽

Frequency Plasma ◽

Hydrogenated Amorphous

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Formation of electrically conductive nitrogen‐doped amorphous hydrogenated carbon (diamond‐like carbon) films by the supermagnetron plasma chemical vapor deposition method

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580363 ◽

1996 ◽

Vol 14 (3) ◽

pp. 1933-1937 ◽

Cited By ~ 25

Author(s):

Haruhisa Kinoshita ◽

Atsushi Yamauchi

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Plasma Chemical ◽

Electrically Conductive ◽

Plasma Chemical Vapor Deposition ◽

Nitrogen Doped ◽

Amorphous Hydrogenated Carbon

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Preparation of Polymer Particles Coated with a Diamond-like Carbon Film by a Polygonal Barrel-Plasma Chemical Vapor Deposition Method

ECS Meeting Abstracts ◽

10.1149/ma2012-02/39/2937 ◽

2012 ◽

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Carbon Film ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Diamond Like Carbon ◽

Deposition Method ◽

Polymer Particles ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Effect of negative pulsed high-voltage-bias on diamond-like carbon thin film preparation using capacitively coupled radio-frequency plasma chemical vapor deposition

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2006.09.057 ◽

2007 ◽

Vol 201 (15) ◽

pp. 6674-6677 ◽

Cited By ~ 6

Author(s):

Y. Ohtsu ◽

H. Noda ◽

C. Nakamura ◽

T. Misawa ◽

H. Fujita ◽

...

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Diamond Like Carbon ◽

Radio Frequency Plasma ◽

Plasma Chemical ◽

Capacitively Coupled ◽

Plasma Chemical Vapor Deposition ◽

Frequency Plasma ◽

Thin Film Preparation ◽

Film Preparation

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Surface modification of silicon wafer by low-pressure high-frequency plasma chemical vapor deposition method

24th ISDEIV 2010 ◽

10.1109/deiv.2010.5625758 ◽

2010 ◽

Cited By ~ 1

Author(s):

H. Kataoka ◽

N. Mungkung ◽

T. Yuji ◽

M. Kawano ◽

Y. Kiyota ◽

...

Keyword(s):

Surface Modification ◽

Vapor Deposition ◽

High Frequency ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

High Frequency Plasma ◽

Frequency Plasma

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