Evolution of optical properties with deposition time of silicon nitride and diamond-like carbon films deposited by radio-frequency plasma-enhanced chemical vapor deposition method

Mateusz Smietana; Wojtek J. Bock; Jan Szmidt

doi:10.1016/j.tsf.2011.04.032

Evolution of optical properties with deposition time of silicon nitride and diamond-like carbon films deposited by radio-frequency plasma-enhanced chemical vapor deposition method

Thin Solid Films ◽

10.1016/j.tsf.2011.04.032 ◽

2011 ◽

Vol 519 (19) ◽

pp. 6339-6343 ◽

Cited By ~ 32

Author(s):

Mateusz Smietana ◽

Wojtek J. Bock ◽

Jan Szmidt

Keyword(s):

Optical Properties ◽

Vapor Deposition ◽

Deposition Time ◽

Chemical Vapor ◽

Carbon Films ◽

Chemical Vapor Deposition Method ◽

Diamond Like Carbon ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Frequency Plasma

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Diamond-like carbon films deposited on polyethylene terephthalate substrates by radio frequency plasma chemical vapor deposition method

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1537717 ◽

2003 ◽

Vol 21 (2) ◽

pp. 515-517 ◽

Cited By ~ 13

Author(s):

Ayako Kimura ◽

Hideyuki Kodama ◽

Tetsuya Suzuki

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Chemical Vapor Deposition Method ◽

Diamond Like Carbon ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Frequency Plasma

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Development ofCH4-Radio-Frequency-Plasma-Enhanced Chemical Vapor Deposition Method with a Positively Self-Biased Electrode for Diamond-Like Carbon Film

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.2817 ◽

1997 ◽

Vol 36 (Part 1, No. 5A) ◽

pp. 2817-2821 ◽

Cited By ~ 6

Author(s):

Hiroshi Inaba ◽

Yuuichi Kokaku ◽

Masatomo Terakado ◽

Hiroyuki Kataoka

Keyword(s):

Chemical Vapor Deposition ◽

Radio Frequency ◽

Vapor Deposition ◽

Carbon Film ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Diamond Like Carbon ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Frequency Plasma

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Electrical and Optical Properties of Si-Incorporated a-C:H Films via the Radio Frequency Plasma-Enhanced Chemical Vapor Deposition Method

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2016.12216 ◽

2016 ◽

Vol 16 (5) ◽

pp. 5394-5397

Author(s):

In Jun Kim ◽

Won Seok Choi ◽

Byungyou Hong

Keyword(s):

Optical Properties ◽

Chemical Vapor Deposition ◽

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Electrical And Optical Properties ◽

Frequency Plasma

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Silicon rich silicon oxide films deposited by radio frequency plasma enhanced chemical vapor deposition method: Optical and structural properties

Applied Surface Science ◽

10.1016/j.apsusc.2011.05.112 ◽

2011 ◽

Vol 257 (23) ◽

pp. 9717-9723 ◽

Cited By ~ 24

Author(s):

Sumita Mukhopadhyay ◽

Swati Ray

Keyword(s):

Chemical Vapor Deposition ◽

Radio Frequency ◽

Structural Properties ◽

Vapor Deposition ◽

Silicon Oxide ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Frequency Plasma

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Mechanical characterization of a-C:H:SiOx coatings synthesized using radio-frequency plasma-assisted chemical vapor deposition method

Thin Solid Films ◽

10.1016/j.tsf.2015.08.017 ◽

2015 ◽

Vol 590 ◽

pp. 299-305 ◽

Cited By ~ 31

Author(s):

D. Batory ◽

A. Jedrzejczak ◽

W. Szymanski ◽

P. Niedzielski ◽

M. Fijalkowski ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Radio Frequency ◽

Vapor Deposition ◽

Mechanical Characterization ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Frequency Plasma

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Electrical conductive hard-carbon (diamond-like carbon) films formed by i-C4H10/N2 supermagnetron plasma chemical vapor deposition method

Thin Solid Films ◽

10.1016/s0040-6090(00)01091-9 ◽

2000 ◽

Vol 373 (1-2) ◽

pp. 251-254 ◽

Cited By ~ 9

Author(s):

Haruhisa Kinoshita ◽

Jun Takahashi ◽

Takuya Hando

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Chemical Vapor Deposition Method ◽

Diamond Like Carbon ◽

Deposition Method ◽

Hard Carbon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Formation of Carbon Nitride Films by the Radio-Frequency Plasma Chemical Vapor Deposition Method

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.4893 ◽

1997 ◽

Vol 36 (Part 1, No. 7B) ◽

pp. 4893-4896 ◽

Cited By ~ 17

Author(s):

Mei Zhang ◽

Ping Wang ◽

Yoshikazu Nakayama

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Carbon Nitride ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Frequency Plasma

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CSW-14: High-rate Synthesis of Diamond-like Carbon Films by Bipolar Nanopulse Chemical Vapor Deposition Method(CSW-III: COATING, SURFACE MODIFICATION AND WEAR)

The Proceedings of the JSME Materials and Processing Conference (M&P) ◽

10.1299/jsmeintmp.2005.45_5 ◽

2005 ◽

Vol 2005 (0) ◽

pp. 45-46

Author(s):

T. SAITO ◽

Y. KONDO ◽

T. TERAZAWA ◽

N. OHTAKE

Keyword(s):

Surface Modification ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

High Rate ◽

Chemical Vapor Deposition Method ◽

Diamond Like Carbon ◽

Deposition Method ◽

Coating Surface

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Photo-induced properties of thin TiO2 films deposited using the radio frequency plasma enhanced chemical vapor deposition method

Thin Solid Films ◽

10.1016/j.tsf.2006.12.183 ◽

2007 ◽

Vol 515 (13) ◽

pp. 5275-5281 ◽

Cited By ~ 19

Author(s):

Hieronim Szymanowski ◽

Anna Sobczyk-Guzenda ◽

Adam Rylski ◽

Witold Jakubowski ◽

Maciej Gazicki-Lipman ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Radio Frequency Plasma ◽

Tio2 Films ◽

Deposition Method ◽

Frequency Plasma

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Selective growth of CNT by using triode-type radio frequency plasma chemical vapor deposition method

Diamond and Related Materials ◽

10.1016/j.diamond.2006.11.066 ◽

2007 ◽

Vol 16 (4-7) ◽

pp. 1106-1109 ◽

Cited By ~ 4

Author(s):

Yoshiyuki Show ◽

Norihiko Fukuzumi

Keyword(s):

Chemical Vapor Deposition ◽

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Frequency Plasma

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