High precision stress measurement of ion projection lithography mask membranes

2002 ◽  
Vol 20 (6) ◽  
pp. 3095 ◽  
Author(s):  
José L. Torres ◽  
J. C. Wolfe ◽  
Paul Ruchhoeft ◽  
Timothy F. Kennedy ◽  
Joseph Podolski ◽  
...  
Keyword(s):  
High Precision ◽  
Stress Measurement ◽  
Projection Lithography ◽  
Ion Projection Lithography

Ion projection lithography for resistless patterning of thin magnetic films

2000 ◽  
Vol 53 (1-4) ◽  
pp. 605-608 ◽  
Author(s):  
W.H. Bruenger ◽  
M. Torkler ◽  
C. Dzionk ◽  
B.D. Terris ◽  
L. Folks ◽  
...  
Keyword(s):  
Magnetic Films ◽  
Projection Lithography ◽  
Thin Magnetic Films ◽  
Ion Projection Lithography

Wafer stage assembly for ion projection lithography

2001 ◽  
Vol 57-58 ◽  
pp. 181-185 ◽  
Author(s):  
Christoph Damm ◽  
Thomas Peschel ◽  
Stephan Risse ◽  
Ulf C. Kirschstein
Keyword(s):  
Projection Lithography ◽  
Ion Projection Lithography

Resist technologies for ion projection lithography (IPL) stencil maskmaking

2000 ◽  
Author(s):  
Mathias Irmscher ◽  
Joerg Butschke ◽  
Klaus Elian ◽  
Bernd Hoefflinger ◽  
Karl Kragler ◽  
...  
Keyword(s):  
Projection Lithography ◽  
Ion Projection Lithography

Reference plate manufacturing process for the ion projection lithography pattern lock system

2001 ◽  
Vol 57-58 ◽  
pp. 213-218
Author(s):  
F. Letzkus ◽  
J. Butschke ◽  
M. Irmscher ◽  
C. Reuter ◽  
R. Springer ◽  
...  
Keyword(s):  
Manufacturing Process ◽  
Projection Lithography ◽  
Ion Projection Lithography ◽  
Reference Plate

The Use of Mn-Kα X-Rays and a New Model of PSPC in Stress Analysis of Stainless Steel

1982 ◽  
Vol 26 ◽  
pp. 209-216 ◽  
Author(s):  
Yasuo Yoshioka ◽  
Ken-ichi Hasegawa ◽  
Koh-ichi Mochiki
Keyword(s):  
Stainless Steel ◽  
Stress Analysis ◽  
High Precision ◽  
Proportional Counter ◽  
Stress Measurement ◽  
X Rays ◽  
New Model ◽  
Major Disadvantage ◽  
Position Sensitive

The authors previously reported stress measurement in stainless steel by the use of monochromatic Cr-Kβ X-rays and a position sensitive proportional counter. Results indicated that a stress value can be obtained with high precision on account of the subtraction of background and the elimination of αFe(211) peak by Cr-Kα X-rays. The major disadvantage of this method, however, is that the intensity of Kβ X-rays monochromatized is essentially weak and it is complicated to eliminate Kα X-rays for practical use.

Ion projection lithography in (in)organic resist layers

1986 ◽  
Vol 5 (1-4) ◽  
pp. 193-200 ◽  
Author(s):  
R. Fischer ◽  
E. Hammel ◽  
H. Löschner ◽  
G. Stengl ◽  
P. Wolf ◽  
...  
Keyword(s):  
Projection Lithography ◽  
Ion Projection Lithography
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