Langmuir probe measurements in an inductively coupled plasma: Electron energy distribution functions in polymerizing fluorocarbon gases used for selective etching of SiO2
2002 ◽
Vol 20
(3)
◽
pp. 919-927
◽
2002 ◽
Vol 20
(2)
◽
pp. 526-529
◽
2012 ◽
Vol 21
(2)
◽
pp. 025003
◽
1994 ◽
Vol 49
(12-14)
◽
pp. 1283-1303
◽
2012 ◽
Vol 21
(2)
◽
pp. 025004
◽
Langmuir probe measurements in a low pressure inductively coupled plasma used for diamond deposition
1999 ◽
Vol 17
(3)
◽
pp. 721-725
◽
1991 ◽
Vol 46
(6-7)
◽
pp. 805-817
◽
1988 ◽
Vol 43
(3)
◽
pp. 273-285
◽