In situanalysis of perfluoro compounds in semiconductor process exhaust: Use of Li+ ion-attachment mass spectrometry

2001 ◽  
Vol 19 (4) ◽  
pp. 1105-1110 ◽  
Author(s):  
M. Nakamura ◽  
K. Hino ◽  
T. Sasaki ◽  
Y. Shiokawa ◽  
T. Fujii
Keyword(s):  
Mass Spectrometry ◽  
Ion Attachment ◽  
Li Ion ◽  
Semiconductor Process

Mass Spectrometry for On-Line Monitoring of Perfluoro Compounds Using Li+Ion Attachment Techniques

2001 ◽  
Vol 73 (13) ◽  
pp. 2937-2940 ◽  
Author(s):  
Toshihiro Fujii ◽  
Sundaram Arulmozhiraja ◽  
Megumi Nakamura ◽  
Yoshiro Shiokawa
Keyword(s):  
Mass Spectrometry ◽  
On Line ◽  
Ion Attachment ◽  
Li Ion

Temperature-resolved thermal analysis of cisplatin by means of Li+ ion attachment mass spectrometry

2010 ◽  
Vol 12 (15) ◽  
pp. 3910 ◽  
Author(s):  
Seiji Takahashi ◽  
Yuki Kitahara ◽  
Megumi Nakamura ◽  
Yoshiro Shiokawa ◽  
Toshihiro Fujii
Keyword(s):  
Mass Spectrometry ◽  
Thermal Analysis ◽  
Ion Attachment ◽  
Li Ion

Evolved Gas Analysis of Ti(C5H5)2Cl2 by Means of Li+ Ion Attachment Mass Spectrometry

2012 ◽  
Vol 116 (2) ◽  
pp. 865-869 ◽  
Author(s):  
Seiji Takahashi ◽  
Takuya Suga ◽  
Yuki Kitahara ◽  
Toshihiro Fujii
Keyword(s):  
Mass Spectrometry ◽  
Evolved Gas Analysis ◽  
Gas Analysis ◽  
Evolved Gas ◽  
Ion Attachment ◽  
Li Ion

Detection of Cu(hfac)(tmvs) by Li+ ion attachment mass spectrometry

2006 ◽  
Vol 425 (1-3) ◽  
pp. 134-137 ◽  
Author(s):  
Toshihiro Fujii ◽  
Sundaram Arulmozhiraja ◽  
Megumi Nakamura ◽  
Yoshiro Shiokawa
Keyword(s):  
Mass Spectrometry ◽  
Ion Attachment ◽  
Li Ion

scholarly journals Chemistry of Cu deposition by Cu(hfac)(tmvs) monitored by Li+ ion attachment mass spectrometry

2006 ◽  
Vol 100 (8) ◽  
pp. 084912 ◽  
Author(s):  
Toshihiro Fujii ◽  
Sundaram Arulmozhiraja ◽  
Megumi Nakamura ◽  
Yoshiro Shiokawa
Keyword(s):  
Mass Spectrometry ◽  
Ion Attachment ◽  
Li Ion

scholarly journals In-Situ Analysis of Perfluoro Compounds in Semiconductor Process Exhaust by Ion Attachment Mass Spectrometry (IAMS).

Shinku ◽  
2002 ◽  
Vol 45 (12) ◽  
pp. 846-853 ◽  
Author(s):  
Megumi NAKAMURA ◽  
Kenji HINO ◽  
Yoshiro SHIOKAWA ◽  
Toshihiro FUJII ◽  
Masao TAKAYANAGI ◽  
...  
Keyword(s):  
Mass Spectrometry ◽  
In Situ Analysis ◽  
Ion Attachment ◽  
Semiconductor Process

Ion attachment mass spectrometry of nonequilibrium atmospheric-pressure pulsed remote plasma for SiO2 etching

2006 ◽  
Vol 100 (9) ◽  
pp. 093304 ◽  
Author(s):  
Masahiro Iwasaki ◽  
Masafumi Ito ◽  
Tsuyoshi Uehara ◽  
Megumi Nakamura ◽  
Masaru Hori
Keyword(s):  
Mass Spectrometry ◽  
Atmospheric Pressure ◽  
Remote Plasma ◽  
Ion Attachment ◽  
Sio2 Etching
Sign in / Sign up

Export Citation Format

Share Document