Electron cyclotron wave resonance plasma assisted deposition of cubic boron nitride thin films

2001 ◽  
Vol 19 (2) ◽  
pp. 485-489 ◽  
Author(s):  
Z. X. Cao
Keyword(s):  
Thin Films ◽  
Boron Nitride ◽  
Cubic Boron Nitride ◽  
Electron Cyclotron ◽  
Wave Resonance ◽  
Electron Cyclotron Wave ◽  
Resonance Plasma

Cubic boron nitride films deposited by electron cyclotron resonance plasma

1990 ◽  
Vol 57 (18) ◽  
pp. 1885-1886 ◽  
Author(s):  
S. Y. Shapoval ◽  
V. T. Petrashov ◽  
O. A. Popov ◽  
A. O. Westner ◽  
M. D. Yoder ◽  
...  
Keyword(s):  
Boron Nitride ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Cubic Boron Nitride ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Boron Nitride Films ◽  
Resonance Plasma

High rate deposition of ta-C:H using an electron cyclotron wave resonance plasma source

1999 ◽  
Vol 337 (1-2) ◽  
pp. 71-73 ◽  
Author(s):  
N.A. Morrison ◽  
S.E. Rodil ◽  
A.C. Ferrari ◽  
J. Robertson ◽  
W.I. Milne
Keyword(s):  
Plasma Source ◽  
Electron Cyclotron ◽  
High Rate ◽  
Wave Resonance ◽  
Electron Cyclotron Wave ◽  
Resonance Plasma

High Rate Deposition of Ta-C:H Using an Electron Cyclotron Wave Resonance Plasma Source

1997 ◽  
Vol 498 ◽  
Author(s):  
N. A. Morrison ◽  
S. Muhl ◽  
S. E. Rodil ◽  
W. I. Milne ◽  
J. Robertson ◽  
...  
Keyword(s):  
Friction Coefficient ◽  
Plasma Source ◽  
Tribological Performance ◽  
Electron Cyclotron ◽  
High Rate ◽  
Ion Energy ◽  
Tetrahedral Amorphous Carbon ◽  
Wave Resonance ◽  
Electron Cyclotron Wave ◽  
Resonance Plasma

ABSTRACTA compact electron cyclotron wave resonance (ECWR) source has been developed for the high rate deposition of hydrogenated tetrahedral amorphous carbon (ta-C:H). The ECWR provides growth rates of up to 900 A/mm and an independent control of the deposition rate and ion energy. The ta-C:H was deposited using acetylene as the source gas and was characterized in terms of its bonding, stress and friction coefficient. The results indicated that the ta-C:H produced using this source fulfills the necessary requirements for applications requiring enhanced tribological performance.

Plasma diagnostics of low pressure high power impulse magnetron sputtering assisted by electron cyclotron wave resonance plasma

2012 ◽  
Vol 112 (9) ◽  
pp. 093305 ◽  
Author(s):  
Vitezslav Stranak ◽  
Ann-Pierra Herrendorf ◽  
Steffen Drache ◽  
Martin Cada ◽  
Zdenek Hubicka ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
High Power ◽  
Plasma Diagnostics ◽  
Low Pressure ◽  
Electron Cyclotron ◽  
Wave Resonance ◽  
Electron Cyclotron Wave ◽  
Resonance Plasma

Deposition of carbon nitride films using an electron cyclotron wave resonance plasma source

2000 ◽  
Vol 9 (3-6) ◽  
pp. 524-529 ◽  
Author(s):  
S. Rodil ◽  
N.A. Morrison ◽  
W.I. Milne ◽  
J. Robertson ◽  
V. Stolojan ◽  
...  
Keyword(s):  
Carbon Nitride ◽  
Plasma Source ◽  
Electron Cyclotron ◽  
Wave Resonance ◽  
Electron Cyclotron Wave ◽  
Resonance Plasma
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