Electrodeposition and Characterization of Very Thin Film II-VI Compounds for Novel Superlattice Solar Cells

2010 ◽  
Author(s):  
Sukriti Jain ◽  
Pritpal Singh
Keyword(s):  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Lead Telluride ◽  
Glass Substrates ◽  
Absorption Spectrophotometry ◽  
Layer Structures ◽  
Deposited Films ◽  
Scanning Electron ◽  
Dense Films

Thin films of lead telluride (PbTe) and zinc telluride (ZnTe) have been electrodeposited on indium tin oxide (ITO)-coated glass substrates. Uniform dense films of ∼ 100 nm have been obtained for both materials. The electrochemical deposition procedures for fabricating these films are described. The as-deposited films have been characterized by scanning electron microscopy, energy dispersive spectroscopy, and optical absorption spectrophotometry. Multi layer structures, up to 3 layers, of ZnTe/PbTe films, have been fabricated.

Recoil Implantation of Ito thin Films on Glass Substrates

1983 ◽  
Vol 27 ◽  
Author(s):  
B. H. Rabin ◽  
B. B. Harbison ◽  
S. R. Shatynski
Keyword(s):  
Thin Films ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Energy Deposition ◽  
Window Glass ◽  
Glass Substrates ◽  
Post Annealing ◽  
Ito Thin Films ◽  
Film Substrate

ABSTRACTIndium-Tin Oxide (ITO) heat mirror films implanted into window glass were obtained by post annealing of argon irradiated coatings of In-5w/o Sn produced by reactive evaporation in oxygen. Characterization of coatings has been carried out using TEM and AES. Optical properties have also been evaluated. The production of acceptable thin films requires low energy deposition rates during ion bombardment. This places a limit on the extent of film-substrate mixing, which is required if increased film lifetimes are to be realized.

Indium Tin Oxide Conductive Nanowires Formed by Magnetron Sputtering

2015 ◽  
Vol 1747 ◽  
Author(s):  
Naoki Yamamoto ◽  
Kirihiko Morisawa
Keyword(s):  
Crystal Structure ◽  
Electron Microscope ◽  
Cross Sections ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Elliptical Cross ◽  
Cubic Crystal ◽  
Glass Substrates ◽  
Order Of Magnitude ◽  
Scanning Electron

ABSTRACTIndium tin oxide (ITO) nanowires (NWs) were grown on glass substrates by using ITO sputtering sources (targets) with SnO2 contents in the range of approximately 5.0 to 30.0 wt%. NW growth became apparent at temperatures above 125 °C, and the In, Sn and O contents of the resulting ITO NWs were similar to those of the ITO source. NWs grown from ITO sources containing 5.0 to 12.0 wt% SnO2 had circular or elliptical cross-sections, while those obtained from sources with 12.0 to 30.0 wt% SnO2 exhibited square cross-sections. ITO NWs approximately 2 μm in length were obtained as single crystals with a cubic crystal structure. The resistivity of an ITO NW was measured using four nanoprobes in conjunction with a field emission scanning electron microscope and was found to range from 0.13 to 0.6 μΩ-m, values that were approximately one order of magnitude lower than those of transparent ITO films.

Electrodeposition and characterization of PbSe films on indium tin oxide glass substrates

2005 ◽  
Vol 10 (1) ◽  
pp. 48-53 ◽  
Author(s):  
KunWei Li ◽  
XiaoTian Meng ◽  
Xue Liang ◽  
Hao Wang ◽  
Hui Yan
Keyword(s):  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Glass ◽  
Glass Substrates ◽  
Indium Tin Oxide Glass

Preparation and Characterization of Dense Films of Poly(amidoamine) Dendrimers on Indium Tin Oxide

Langmuir ◽  
2007 ◽  
Vol 23 (17) ◽  
pp. 8916-8924 ◽  
Author(s):  
Robert Schlapak ◽  
David Armitage ◽  
Nadia Saucedo-Zeni ◽  
Gianluca Latini ◽  
Hermann J. Gruber ◽  
...  
Keyword(s):  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Dense Films

Determination of Thickness of PZO Films Deposited on ITO Glass Substrates

2013 ◽  
Vol 537 ◽  
pp. 161-164
Author(s):  
Xue Jiao Li ◽  
Cheng Zhang ◽  
Na Zhang
Keyword(s):  
Film Thickness ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Room Temperature ◽  
Glass Substrates ◽  
Testing Method ◽  
Ito Glass ◽  
Microhardness Testing ◽  
Deposited Films

PZO (PbZrO3) coatings with different thicknesses were deposited onto Indium Tin Oxide ITO glass substrates at room temperature by magnetron sputtering technique. UV-Vis absorption spectra method and microhardness testing method were used to measure the thickness of coating. It was proved that the measuring results of film thickness by two kinds of methods were equivalent, and either one method can be alternatively used to determine the thickness of deposited films.

Characterization of Oxygen Accumulation in Indium-Tin-Oxide for Resistance Random Access Memory

2014 ◽  
Vol 35 (6) ◽  
pp. 630-632 ◽  
Author(s):  
Rui Zhang ◽  
Tai-Fa Young ◽  
Min-Chen Chen ◽  
Hsin-Lu Chen ◽  
Shu-Ping Liang ◽  
...  
Keyword(s):  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Random Access ◽  
Random Access Memory ◽  
Access Memory ◽  
Resistance Random Access Memory
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