DoD Design Cloud Analysis: Securing the Integrated Circuit Design Process

Author(s):  
Mario N. Gomez

The use of unsecure foundries has allowed and is still providing a pathway for counterfeit microelectronics into U.S. defense systems. As a result, the Warfighter has been put at risk and a solution is needed. To counter this dilemma, this study looks into the feasibility of creating a Department of Defense (DoD) - wide design cloud that would provide circuit designers with a more secure and economical way of designing and fabricating circuits. The design cloud would include secure communication to trusted foundries along with needed circuit design software. Factors such as security, costs, benefits, and issues are taken into consideration in determining whether the use of the cloud would actually aid the integrated circuit design process.

Author(s):  
Hung-Sung Lin ◽  
Ying-Chin Hou ◽  
Juimei Fu ◽  
Mong-Sheng Wu ◽  
Vincent Huang ◽  
...  

Abstract The difficulties in identifying the precise defect location and real leakage path is increasing as the integrated circuit design and process have become more and more complicated in nano scale technology node. Most of the defects causing chip leakage are detectable with only one of the FA (Failure Analysis) tools such as LCD (Liquid Crystal Detection) or PEM (Photon Emission Microscope). However, due to marginality of process-design interaction some defects are often not detectable with only one FA tool [1][2]. This paper present an example of an abnormal power consumption process-design interaction related defect which could only be detected with more advanced FA tools.


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