scholarly journals Electrically conductive silicon oxycarbide thin films prepared from preceramic polymers

2021 ◽  
Author(s):  
Emmanuel III Ricohermoso ◽  
Florian Klug ◽  
Helmut Schlaak ◽  
Ralf Riedel ◽  
Emanuel Ionescu
Keyword(s):  
Thin Films ◽  
Silicon Oxycarbide ◽  
Electrically Conductive ◽  
Preceramic Polymers

scholarly journals The origin of white luminescence from silicon oxycarbide thin films

2014 ◽  
Vol 104 (6) ◽  
pp. 061906 ◽  
Author(s):  
V. Nikas ◽  
S. Gallis ◽  
M. Huang ◽  
A. E. Kaloyeros ◽  
A. P. D. Nguyen ◽  
...  
Keyword(s):  
Thin Films ◽  
Silicon Oxycarbide ◽  
White Luminescence

Type of precursor and synthesis of silicon oxycarbide (SiOxCyH) thin films with a surfatron microwave oxygen/argon plasma

2006 ◽  
Vol 24 (4) ◽  
pp. 988-994 ◽  
Author(s):  
Agnieszka Walkiewicz-Pietrzykowska ◽  
J. P. Espinós ◽  
Agustin R. González-Elipe
Keyword(s):  
Thin Films ◽  
Argon Plasma ◽  
Silicon Oxycarbide

Residual Stress in Sputtered Silicon Oxycarbide Thin Films

2011 ◽  
Vol 1299 ◽  
Author(s):  
Ping Du ◽  
I-Kuan Lin ◽  
Yunfei Yan ◽  
Xin Zhang
Keyword(s):  
Thin Films ◽  
Residual Stress ◽  
Elevated Temperatures ◽  
Silicon Oxide ◽  
Composite Films ◽  
Deposition Process ◽  
Silicon Oxycarbide ◽  
X Ray ◽  
Curvature Measurement ◽  
Film Substrate

ABSTRACTSilicon carbide (SiC) has received increasing attention on the integration of microelectro-mechanical system (MEMS) due to its excellent mechanical and chemical stability at elevated temperatures. However, the deposition process of SiC thin films tends to induce relative large residual stress. In this work, the relative low stress material silicon oxide was added into SiC by RF magnetron co-sputtering to form silicon oxycarbide (SiOC) composite films. The composition of the films was characterized by Energy dispersive X-ray (EDX) analysis. The Young’s modulus and hardness of the films were measured by nanoindentation technique. The influence of oxygen/carbon ratio and rapid thermal annealing (RTA) temperature on the residual stress of the composite films was investigated by film-substrate curvature measurement using the Stoney’s equation. By choosing the appropriate composition and post processing, a film with relative low residual stress could be obtained.

Fabrication of highly electrically conductive Ti/Ag/Ti tri-layer and Ti–Ag alloy thin films on PET fabrics by multi-target magnetron sputtering

2018 ◽  
Vol 29 (22) ◽  
pp. 19578-19587 ◽  
Author(s):  
Chuanmei Liu ◽  
Jiangtao Xu ◽  
Zhengqin Liu ◽  
Xin Ning ◽  
Shouxiang Jiang ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Electrically Conductive

scholarly journals Electrically Conductive Thin Films Based on Nanofibrillated Cellulose: Interactions with Water and Applications in Humidity Sensing

2020 ◽  
Vol 12 (32) ◽  
pp. 36437-36448 ◽  
Author(s):  
Katariina Solin ◽  
Maryam Borghei ◽  
Ozlem Sel ◽  
Hannes Orelma ◽  
Leena-Sisko Johansson ◽  
...  
Keyword(s):  
Thin Films ◽  
Nanofibrillated Cellulose ◽  
Electrically Conductive ◽  
Humidity Sensing ◽  
Conductive Thin Films

Preparation and Properties of Infrared Transparent Condutive Thin Films

2009 ◽  
Vol 1220 ◽  
Author(s):  
Yiding Wang ◽  
Li Li ◽  
Junjing Chen ◽  
Zhenyu Song ◽  
Yupeng An ◽  
...  
Keyword(s):  
Thin Films ◽  
Great Influence ◽  
Preparation Condition ◽  
Infrared Transmission ◽  
Electrically Conductive ◽  
X Ray ◽  
Atomic Force ◽  
Visible Transmittance ◽  
Ir Transmission ◽  
Conductive Thin Films

AbstractThis paper presents results for infrared transparent and conducting thin films based on In2O3. The films have been prepared by magnetrons sputtering equipment with different condition. Typical transmittance of 70%-80% with a film sheet resistance of 80-300Ω/□ in the 3.5-5.0μrn region has been achieved.Optically transparent and electrically conductive semiconductor Oxide films have been extensively studied in recent years. Such films have been prepared by various methods. In general, these films have high visible transmittance, but are opaque in the IR wavelength range of 1-12μm IR transmission. The infrared transparent and electrically conductive thin films are useful in certain important applications. For example, these films can be use as antistatic coatings, and while permitting a reasonable transmission coefficient for IR. Another obvious application is to serve as the conducting electrode for various optical devices where good infrared transmission is important. So, it is important to research indium oxide base infrared (3-5 um) transparent conduction thin films.It has been developed that preparation condition influence on properties of thin films. Such as the sputtering time, and pressure, and power, and the substrate temperature, had great influence on the crystal structure, optical and electrical properties of In2O3-based thin films.The In2O3-based thin films obtained were characterized and analyzed by X-ray Diffractometer (XRD), Atomic Force Microscope (AFM), Vander Pauw Method and Fourier Transform Infrared Spectroscopy (FTIR).

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