Plasma-Enhanced Chemical Vapor Deposition of Amorphous Fluorocarbon Polymer Films ( $a$-C:F) on Spherical Surfaces

2008 ◽  
Vol 36 (4) ◽  
pp. 890-891 ◽  
Author(s):  
Costel Biloiu ◽  
Yosuke Sakai
Keyword(s):  
Chemical Vapor Deposition ◽  
Polymer Films ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Spherical Surfaces ◽  
Fluorocarbon Polymer

A Basic Monte Carlo Model of Initiated Chemical Vapor Deposition Using Kinetic Theory

2014 ◽  
Vol 1704 ◽  
Author(s):  
Hayley R. Osman ◽  
Saibal Mitra
Keyword(s):  
Monte Carlo ◽  
Chemical Vapor Deposition ◽  
Polymer Films ◽  
Vapor Deposition ◽  
Monte Carlo Model ◽  
Chemical Vapor ◽  
Reaction Chamber ◽  
Initial Growth ◽  
Time Step ◽  
Initiated Chemical Vapor Deposition

ABSTRACTInitiated Chemical Vapor Deposition (iCVD) is a well-known method for depositing polymers that are used in chemical, biological, and electrical applications. It is a variation of hot filament deposition and can used to produce conformal coatings of polymer films at relatively low reaction temperatures. It is also a solventless technique in which thin polymeric films are deposited by introducing controlled ratios of monomer and initiator gasses into the reaction chamber. Low temperatures in the reaction chamber allow the deposition of polymer films on a wide variety of substrates that include biological substrates.We have simulated the growth of a monolayer of polymer films on two-dimensional surfaces using Monte Carlo simulation. We saw the formation of polymer chains over a time scale on the order of microseconds. We have assumed the substrate to be at room temperature while the reactor pressure close of 800 mTorr.The grid on which we have simulated this polymer growth is represented by a 100x100 matrix, on which a series of specialized functions are executed in each time-step, or iteration. These functions can be divided into three categories: population, translation, and polymerization.The goal of this simulation is to observe the initial growth of the iCVD surface reaction. We have obtained favorable results with the simulation and we are now looking to compare these results with experimental results for initiation growth.

Plasma enhanced chemical vapor deposition of high refractive index polymer films

2008 ◽  
Author(s):  
Jesse O. Enlow ◽  
Hao Jiang ◽  
Kurt G. Eyink ◽  
John T. Grant ◽  
Weijie Su ◽  
...  
Keyword(s):  
Refractive Index ◽  
Chemical Vapor Deposition ◽  
Polymer Films ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
High Refractive Index

Chemical Vapor Deposition of Conformal, Functional, and Responsive Polymer Films

2009 ◽  
Vol 22 (18) ◽  
pp. 1993-2027 ◽  
Author(s):  
Mahriah E. Alf ◽  
Ayse Asatekin ◽  
Miles C. Barr ◽  
Salmaan H. Baxamusa ◽  
Hitesh Chelawat ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Polymer Films ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Responsive Polymer

Scale-up of oCVD: large-area conductive polymer thin films for next-generation electronics

2015 ◽  
Vol 2 (2) ◽  
pp. 221-227 ◽  
Author(s):  
Peter Kovacik ◽  
Gabriella del Hierro ◽  
William Livernois ◽  
Karen K. Gleason
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Polymer Films ◽  
Vapor Deposition ◽  
Low Cost ◽  
Scale Up ◽  
Conductive Polymer ◽  
Chemical Vapor ◽  
Next Generation ◽  
Large Area

We demonstrate large-area conductive polymer films using oxidative chemical vapor deposition and apply them to low-cost and durable conductive textiles.

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