scholarly journals Oxidative Chemical Vapor Deposition of Conducting Polymer Films on Nanostructured Surfaces for Piezoresistive Sensor Applications

2020 ◽  
pp. 2000871
Author(s):  
Fabian Muralter ◽  
Anna Maria Coclite ◽  
Kenneth K.S. Lau
Keyword(s):  
Chemical Vapor Deposition ◽  
Conducting Polymer ◽  
Polymer Films ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Nanostructured Surfaces ◽  
Sensor Applications ◽  
Piezoresistive Sensor ◽  
Conducting Polymer Films

H2S Gas Sensor Based on WO3 Nanostructures Synthesized via Aerosol Assisted Chemical Vapor Deposition Technique

2019 ◽  
Vol 11 (9) ◽  
pp. 1247-1256 ◽  
Author(s):  
T. Shujah ◽  
M. Ikram ◽  
A. R. Butt ◽  
M. K. Shahzad ◽  
K. Rashid ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Gas Sensors ◽  
Vapor Deposition ◽  
Gas Sensing ◽  
Chemical Vapor ◽  
Desorption Kinetics ◽  
Nanostructured Surfaces ◽  
Vapor Deposition Technique ◽  
H2s Gas Sensor ◽  
Adsorption Desorption

Herein we demonstrate tungsten oxide (WO3 nanostructures based resistive type sensors for hydrogen sulfide (H2S) gas sensing utility. The WO3 dynamic layers have been deposited upon alumina substrates pre-patterned with gold (Au) interdigitated electrodes. For comparative study, two distinct WO3 nanostructures (S-425 and S-450) have been synthesized using Aerosol Assisted Chemical Vapor Deposition (AACVD) technique at varied deposition temperatures i.e., 425 and 450 °C, respectively. The gas detecting properties of both sensors were investigated against varied concentration (0-60 ppm) of H2S gas levels. The electrical resistance of fabricated gas detectors has been observed at DC bias of 5 V and low operating temperature 250 °C. Specifically, when concentration of H2S gas increases from 0-10 ppm, average resistance of the S-425 and S-450 gas sensors was observed to decrease by 96.5% and 97.6%, respectively. In general, the sensing mechanism of gas sensors proposed in this work can be associated with ionosorption of oxygen species over WO3 nanostructured surfaces. However, the significantly enhanced sensing performance of S-450 sensor may be attributed to improved crystallinity in its structure and improved ions adsorption/desorption kinetics at nanorods surface morphology.

A Basic Monte Carlo Model of Initiated Chemical Vapor Deposition Using Kinetic Theory

2014 ◽  
Vol 1704 ◽  
Author(s):  
Hayley R. Osman ◽  
Saibal Mitra
Keyword(s):  
Monte Carlo ◽  
Chemical Vapor Deposition ◽  
Polymer Films ◽  
Vapor Deposition ◽  
Monte Carlo Model ◽  
Chemical Vapor ◽  
Reaction Chamber ◽  
Initial Growth ◽  
Time Step ◽  
Initiated Chemical Vapor Deposition

ABSTRACTInitiated Chemical Vapor Deposition (iCVD) is a well-known method for depositing polymers that are used in chemical, biological, and electrical applications. It is a variation of hot filament deposition and can used to produce conformal coatings of polymer films at relatively low reaction temperatures. It is also a solventless technique in which thin polymeric films are deposited by introducing controlled ratios of monomer and initiator gasses into the reaction chamber. Low temperatures in the reaction chamber allow the deposition of polymer films on a wide variety of substrates that include biological substrates.We have simulated the growth of a monolayer of polymer films on two-dimensional surfaces using Monte Carlo simulation. We saw the formation of polymer chains over a time scale on the order of microseconds. We have assumed the substrate to be at room temperature while the reactor pressure close of 800 mTorr.The grid on which we have simulated this polymer growth is represented by a 100x100 matrix, on which a series of specialized functions are executed in each time-step, or iteration. These functions can be divided into three categories: population, translation, and polymerization.The goal of this simulation is to observe the initial growth of the iCVD surface reaction. We have obtained favorable results with the simulation and we are now looking to compare these results with experimental results for initiation growth.

Plasma enhanced chemical vapor deposition of high refractive index polymer films

2008 ◽  
Author(s):  
Jesse O. Enlow ◽  
Hao Jiang ◽  
Kurt G. Eyink ◽  
John T. Grant ◽  
Weijie Su ◽  
...  
Keyword(s):  
Refractive Index ◽  
Chemical Vapor Deposition ◽  
Polymer Films ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
High Refractive Index

Chemical Vapor Deposition of Conformal, Functional, and Responsive Polymer Films

2009 ◽  
Vol 22 (18) ◽  
pp. 1993-2027 ◽  
Author(s):  
Mahriah E. Alf ◽  
Ayse Asatekin ◽  
Miles C. Barr ◽  
Salmaan H. Baxamusa ◽  
Hitesh Chelawat ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Polymer Films ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Responsive Polymer
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