Pattern Pruner: Automatic Pattern Size Reduction Method that Uses Computational Intelligence-Based Testing

Author(s):  
Eric Liau Chee Hong ◽  
Manfred Menke ◽  
Thomas Janik ◽  
Doris Schmitt-Landsiedel
2013 ◽  
Vol 832 ◽  
pp. 415-418 ◽  
Author(s):  
Mohammad Nuzaihan Md Nor ◽  
Uda Hashim ◽  
Taib Nazwa ◽  
Tijjani Adam

A simple method for the fabrication of silicon nanowires using Electron Beam Lithography (EBL) combined with thermal oxidation size reduction method is presented. EBL is used to define the initial silicon nanowires of dimensions approximately 100 nm. Size-reduction method is employed for reaching true nanoscale of dimensions approximately 20 nm. Dry oxidation of silicon is well investigated process for self-limited size-reduction of silicon nanowires. In this paper, successful size reduction of silicon nanowires is presented and surface topography characterizations using Atomic Force Microscopy (AFM) are reported.


2007 ◽  
Vol 46 (9B) ◽  
pp. 6395-6397 ◽  
Author(s):  
Atsushi Yokoo ◽  
Kazumi Wada ◽  
Lionel C. Kimerling
Keyword(s):  

Author(s):  
Yuuki Shibata ◽  
Kazutaka Kamimura ◽  
Tomoaki Tsumura ◽  
Hiroshi Matsuo ◽  
Yasuhiko Nakashima

2013 ◽  
Vol 40 (3) ◽  
pp. 431-454 ◽  
Author(s):  
Jon Hills ◽  
Anthony Bagnall ◽  
Beatriz de la Iglesia ◽  
Graeme Richards

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