Characterization of AlGaN/GaN HEMTs Using Gate Resistance Thermometry

2017 ◽  
Vol 64 (1) ◽  
pp. 78-83 ◽  
Author(s):  
Georges Pavlidis ◽  
Spyridon Pavlidis ◽  
Eric R. Heller ◽  
Elizabeth A. Moore ◽  
Ramakrishna Vetury ◽  
...  
2018 ◽  
pp. 1800503
Author(s):  
Adrien Cutivet ◽  
Meriem Bouchilaoun ◽  
Bilal Hassan ◽  
Christophe Rodriguez ◽  
Ali Soltani ◽  
...  

2017 ◽  
Vol 38 (2) ◽  
pp. 240-243 ◽  
Author(s):  
Adrien Cutivet ◽  
Flavien Cozette ◽  
Meriem Bouchilaoun ◽  
Ahmed Chakroun ◽  
Osvaldo Arenas ◽  
...  

Author(s):  
Sweta Pendyala ◽  
Dave Albert ◽  
Katherine Hawkins ◽  
Michael Tenney

Abstract Resistive gate defects are unusual and difficult to detect with conventional techniques [1] especially on advanced devices manufactured with deep submicron SOI technologies. An advanced localization technique such as Scanning Capacitance Imaging is essential for localizing these defects, which can be followed by DC probing, dC/dV, CV (Capacitance-Voltage) measurements to completely characterize the defect. This paper presents a case study demonstrating this work flow of characterization techniques.


2019 ◽  
Vol 66 (1) ◽  
pp. 330-336 ◽  
Author(s):  
Georges Pavlidis ◽  
Shamit Som ◽  
Jason Barrett ◽  
Wayne Struble ◽  
Samuel Graham

2017 ◽  
Vol 64 (5) ◽  
pp. 2135-2141 ◽  
Author(s):  
Agostino Benvegnu ◽  
Sylvain Laurent ◽  
Olivier Jardel ◽  
Jean-Luc Muraro ◽  
Matteo Meneghini ◽  
...  

Author(s):  
Pedro M. Tome ◽  
Filipe M. Barradas ◽  
Luis C. Nunes ◽  
Joao L. Gomes ◽  
Telmo R. Cunha ◽  
...  
Keyword(s):  

2013 ◽  
Vol 19 (S2) ◽  
pp. 452-453
Author(s):  
H. Ghassemi ◽  
A. Lang ◽  
C. Johnson ◽  
R. Wang ◽  
B. Song ◽  
...  
Keyword(s):  
Ex Situ ◽  

Extended abstract of a paper presented at Microscopy and Microanalysis 2013 in Indianapolis, Indiana, USA, August 4 – August 8, 2013.


2010 ◽  
Vol 54 (5) ◽  
pp. 582-585 ◽  
Author(s):  
Heng-Kuang Lin ◽  
Fan-Hsiu Huang ◽  
Hsiang-Lin Yu
Keyword(s):  

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