Characteristic Degradation of Poly-Si Thin-Film Transistors With Large Grains From the Viewpoint of Grain Boundary Location

2011 ◽  
Vol 58 (6) ◽  
pp. 1748-1751 ◽  
Author(s):  
Mutsumi Kimura ◽  
Charalabos A. Dimitriadis
Author(s):  
Chih-Yang Chen ◽  
Ming-Wen Ma ◽  
Wei-Cheng Chen ◽  
Hsiao-Yi Lin ◽  
Kuan-Lin Yeh ◽  
...  

1995 ◽  
Vol 403 ◽  
Author(s):  
Hiroshi Okumura ◽  
Hiroshi Tanabe ◽  
Fujio Okumura

AbstractWe have found, for excimer laser crystallized poly-Si thin films, that there are two different grain growth processes that depend on the energy density. Columnar grains grow laterally at lower energy densities. The other grain growth process at higher energy densities is shown to be secondary grain growth caused by a less oriented structure with fine granular grains. A TFT with the maximum mobility is obtained at the border for the lower energy grain growth. Grain boundary and intragrain defects around grain boundary formed through the secondary grain growth reduce the mobility in spite of considerable grain enlargement.


1998 ◽  
Vol 37 (Part 1, No. 4A) ◽  
pp. 1721-1726 ◽  
Author(s):  
G. A. Armstrong ◽  
S. Uppal ◽  
S. D. Brotherton ◽  
J. R. Ayres

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