High Photo-to-Dark-Current Ratio in SiGe/Si Schottky-Barrier Photodetectors by Using an a-Si:H Cap Layer

2007 ◽  
Vol 54 (9) ◽  
pp. 2386-2391 ◽  
Author(s):  
Jun-Dar Hwang ◽  
Y.H. Chen ◽  
C.Y. Kung ◽  
J.C. Liu
2012 ◽  
Vol 21 (01) ◽  
pp. 1250014 ◽  
Author(s):  
L. S. CHUAH ◽  
S. M. THAHAB ◽  
Z. HASSAN

Nitrogen plasma-assisted molecular beam epitaxy (PAMBE) deposited GaN thin films on (111) n-type silicon substrate with different thickness AlN buffer layers are investigated and distinguished by X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM) and Raman scattering. The thickness of AlN buffer layer ranged from 200 nm to 300 nm. Besides that, the electrical characteristics of the GaN thin film for ultraviolet detecting utilizations are studied by calculating the photo current/dark current ratio on a metal-semiconductor-metal (MSM) photodiode with and without the illumination of Hg-lamp source. The devices have been tested over room temperature (RT). The photocurrent analysis, together with the study of Schottky barrier height (SBH) development, ascertain that the principal mechanism of photo transport is thermionic emission. The photocurrent value is rigorously dependent on Schottky barrier height. The GaN/AlN(200 nm)/n-Si MSM photodiode produces the highest photo/dark current ratio for the lowest strain that consists of the GaN film grown on the AlN (200 nm) buffer layer.


1992 ◽  
Vol 28 (11) ◽  
pp. 992-995 ◽  
Author(s):  
S.V. Averin ◽  
A. Kohl ◽  
R. Müller ◽  
A. Mesquida Küsters ◽  
J. Wisser ◽  
...  

2004 ◽  
Vol 25 (9) ◽  
pp. 593-595 ◽  
Author(s):  
M.L. Lee ◽  
J.K. Sheu ◽  
Y.K. Su ◽  
S.J. Chang ◽  
W.C. Lai ◽  
...  

2003 ◽  
Vol 798 ◽  
Author(s):  
G. C. Chi ◽  
J. K. Sheu ◽  
M. L. Lee ◽  
C. J. Kao ◽  
Y. K. Su ◽  
...  

ABSTRACTAlGaN/GaN-based ultraviolet (UV) Schottky barrier photodetectors (PDs) with and without the LT GaN cap layer were both fabricated. It was found that we could achieve a lower leakage current from sample A. With incident light wavelength of 320 nm and a –1 V reverse bias, the measured responsivity was around 0.03 A/W and 0.015 A/W for samples with and without the LT GaN cap layer, respectively. The response speed of the sample A was also found to be faster.


2016 ◽  
Vol 4 (15) ◽  
pp. 3113-3118 ◽  
Author(s):  
Yue Teng ◽  
Le Xin Song ◽  
Wei Liu ◽  
Zhe Yuan Xu ◽  
Qing Shan Wang ◽  
...  

We successfully synthesized ZnGa2O4 microflowers self-assembled by hexagonal single-crystalline nanopetals. The ZnGa2O4 crystal exhibits improved solar-blind detection performance such as short response time, large light to dark current ratio and high photocurrent stability under zero bias voltage.


2012 ◽  
Vol 05 (03) ◽  
pp. 1250021 ◽  
Author(s):  
SOUMEN DHARA ◽  
P. K. GIRI

In this work, we investigated the effect of organic CuPc coating on the surface of the ZnO NWs for possible improvement in the photoluminescence, photoconductivity and photoresponse. As a result of surface covering, the UV emission is enhanced by a factor of 7–8 while the green emission is reduced to half. Despite an increase in dark current after the CuPc covering, we obtained a significant improvement in the photocurrent and photoresponse rate. The photocurrent-to-dark current ratio is nearly doubled and the photoresponse process becomes faster for the ZnO/CuPc heterostructure. Improvements in the photoluminescence and photoconductivity for the ZnO/CuPc heterostructure are explained on the basis of modification of surface defects and interfacial charge transfer process.


2021 ◽  
Vol 15 (1) ◽  
pp. 016501
Author(s):  
Fumio Otsuka ◽  
Hironobu Miyamoto ◽  
Akio Takatsuka ◽  
Shinji Kunori ◽  
Kohei Sasaki ◽  
...  

Abstract We fabricated high forward and low leakage current trench MOS-type Schottky barrier diodes (MOSSBDs) in combination with a field plate on a 12 μm thick epitaxial layer grown by halide vapor phase epitaxy on β-Ga2O3 (001) substrate. The MOSSBDs, measuring 1.7 × 1.7 mm2, exhibited a forward current of 2 A (70 A cm−2) at 2 V forward voltage and a leakage current of 5.7 × 10–10 A at −1.2 kV reverse voltage (on/off current ratio of > 109) with an ideality factor of 1.05 and wafer-level specific on-resistance of 17.1 mΩ · cm2.


2003 ◽  
Vol 82 (17) ◽  
pp. 2913-2915 ◽  
Author(s):  
M. L. Lee ◽  
J. K. Sheu ◽  
W. C. Lai ◽  
S. J. Chang ◽  
Y. K. Su ◽  
...  

2021 ◽  
Author(s):  
Soumen Dhara ◽  
Kham Niang ◽  
Andrew Flewitt ◽  
Arokia Nathan ◽  
Stephen Lynch

Abstract We report on a strong persistent photoconductivity (PPC) induced appearance of conductor‑like behaviour in zinc-tin-oxide (ZTO) photo-thinfilm transistors (TFT). The active ZTO channel layer was prepared by remote-plasma reactive sputtering and possesses an amorphous structure. Under sub-bandgap excitation of ZTO with UV light, the photocurrent reaches as high as ~10-4 A (a photo-to-dark current ratio of ~107) and remains close to this high value after switching off the light. During this time, the ZTO TFT exhibits strong PPC with long-lasting recovery time, which leads the appearance of the conductor‑like behaviour in ZTO semiconductor. In the present case, the conductivity changes over six orders of magnitude, from ~10-7 to 0.92 Ω-1cm-1. After UV exposure, the ZTO compound can potentially remain in the conducting state for up to a month. The underlying physics of the observed PPC effect is investigated by studying defects (deep-states and tail-states) by employing a discharge current analysis (DCA) technique. Findings from the DCA study reveal direct evidence for the involvement of sub-gap tail-states of the ZTO in the strong PPC, while deep-states contribute to mild PPC.


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