Numerical modeling of silicon film deposition in very-high-frequency plasma reactor

2003 ◽  
Author(s):  
K. Satake ◽  
Y. Kobayashi ◽  
S. Morita
Keyword(s):  
Numerical Modeling ◽  
High Frequency ◽  
Plasma Reactor ◽  
Silicon Film ◽  
Film Deposition ◽  
Very High Frequency ◽  
High Frequency Plasma ◽  
Frequency Plasma ◽  
Very High

Effect of the very high frequency plasma with a balanced power feeding on silicon film deposition

2012 ◽  
Vol 523 ◽  
pp. 41-45 ◽  
Author(s):  
Hiroshi Muta ◽  
Kenta Mizuno ◽  
Satoshi Nishida ◽  
Shizuma Kuribayashi
Keyword(s):  
High Frequency ◽  
Silicon Film ◽  
Film Deposition ◽  
Very High Frequency ◽  
High Frequency Plasma ◽  
Frequency Plasma ◽  
Very High

Characteristics of Very High Frequency Plasma Produced Using a Ladder-Shaped Electrode

1999 ◽  
Vol 38 (Part 1, No. 7B) ◽  
pp. 4305-4308 ◽  
Author(s):  
Hiroshi Mashima ◽  
Masayoshi Murata ◽  
Yoshiaki Takeuchi ◽  
Hideo Yamakoshi ◽  
Tatsuji Horioka ◽  
...  
Keyword(s):  
High Frequency ◽  
Very High Frequency ◽  
High Frequency Plasma ◽  
Frequency Plasma ◽  
Very High
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