A technique for uniform generation of very-high-frequency plasma suited to large-area thin-film deposition

2006 ◽  
Vol 88 (8) ◽  
pp. 081502 ◽  
Author(s):  
H. Yamakoshi ◽  
K. Satake ◽  
Y. Takeuchi ◽  
H. Mashima ◽  
T. Aoi
Keyword(s):  
Thin Film ◽  
High Frequency ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Large Area ◽  
Very High Frequency ◽  
High Frequency Plasma ◽  
Frequency Plasma ◽  
Uniform Generation ◽  
Very High

Recent advances in very high frequency plasma enhanced CVD process for the fabrication of thin film silicon solar cells

2009 ◽  
Vol 517 (17) ◽  
pp. 4758-4761 ◽  
Author(s):  
Jatindra K. Rath ◽  
Yanchao Liu ◽  
Monica Brinza ◽  
Arjan Verkerk ◽  
Caspar van Bommel ◽  
...  
Keyword(s):  
Thin Film ◽  
Solar Cells ◽  
High Frequency ◽  
Silicon Solar Cells ◽  
Very High Frequency ◽  
Plasma Enhanced Cvd ◽  
Recent Advances ◽  
High Frequency Plasma ◽  
Frequency Plasma ◽  
Very High

Effect of the very high frequency plasma with a balanced power feeding on silicon film deposition

2012 ◽  
Vol 523 ◽  
pp. 41-45 ◽  
Author(s):  
Hiroshi Muta ◽  
Kenta Mizuno ◽  
Satoshi Nishida ◽  
Shizuma Kuribayashi
Keyword(s):  
High Frequency ◽  
Silicon Film ◽  
Film Deposition ◽  
Very High Frequency ◽  
High Frequency Plasma ◽  
Frequency Plasma ◽  
Very High

Characteristics of Very High Frequency Plasma Produced Using a Ladder-Shaped Electrode

1999 ◽  
Vol 38 (Part 1, No. 7B) ◽  
pp. 4305-4308 ◽  
Author(s):  
Hiroshi Mashima ◽  
Masayoshi Murata ◽  
Yoshiaki Takeuchi ◽  
Hideo Yamakoshi ◽  
Tatsuji Horioka ◽  
...  
Keyword(s):  
High Frequency ◽  
Very High Frequency ◽  
High Frequency Plasma ◽  
Frequency Plasma ◽  
Very High
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