scholarly journals Selectively excited blue luminescence in heavily Mg doped p-type GaN

Author(s):  
J.S. Colton ◽  
P.Y. Yu
Keyword(s):  
P Type ◽  
2016 ◽  
Vol 253 (10) ◽  
pp. 1960-1964 ◽  
Author(s):  
N. Cifuentes ◽  
H. Limborço ◽  
E. R. Viana ◽  
D. B. Roa ◽  
A. Abelenda ◽  
...  

RSC Advances ◽  
2014 ◽  
Vol 4 (78) ◽  
pp. 41294-41300 ◽  
Author(s):  
Y. S. Zou ◽  
H. P. Wang ◽  
S. L. Zhang ◽  
D. Lou ◽  
Y. H. Dong ◽  
...  

P-type Mg doped CuAlO2 films with high crystallinity are prepared by pulsed laser deposition followed by annealing, and exhibit enhanced conductivity and tunable optical band gaps.


2015 ◽  
Vol 106 (22) ◽  
pp. 222103 ◽  
Author(s):  
Erin C. H. Kyle ◽  
Stephen W. Kaun ◽  
Erin C. Young ◽  
James S. Speck
Keyword(s):  
P Type ◽  

2005 ◽  
Vol 44 (4A) ◽  
pp. 1726-1729 ◽  
Author(s):  
Jun-Dar Hwang ◽  
Zhca-Yong Lai ◽  
Ching-Yuan Wu ◽  
Shoou-Jinn Chang

1996 ◽  
Vol 449 ◽  
Author(s):  
L. V. JØrgensen ◽  
A. C. Kruseman ◽  
H. Schut ◽  
A. Van Veen ◽  
M. Fanciulli ◽  
...  

ABSTRACTPositron beam analysis has been performed on autodoped n-type, semi-insulating and Mg doped p-type epitaxially grown layers of GaN on sapphire. Doppler Broadening measurements clearly indicate the presence of vacancies in the intrinsically autodoped n-type GaN by an increase in the annihilation Doppler lineshape S-parameter of 1.04 relative to the value for the high resistivity sample. This value is typical for vacancy-type defects in compound semiconductors such as GaAs. Results of experiments with higher sensitivity to core-electrons are also presented. These two detector coincidence measurements yield information on the chemical environment surrounding the vacancies. The results are consistent with the presence of Ga vacancies in the autodoped n-type sample.


2020 ◽  
Vol 13 (6) ◽  
pp. 061007 ◽  
Author(s):  
Kazuki Ohnishi ◽  
Yuki Amano ◽  
Naoki Fujimoto ◽  
Shugo Nitta ◽  
Yoshio Honda ◽  
...  

2020 ◽  
Vol 525 ◽  
pp. 146002 ◽  
Author(s):  
Teboho P. Mokoena ◽  
Zamaswazi P. Tshabalala ◽  
Kenneth T. Hillie ◽  
Hendrik C. Swart ◽  
David E. Motaung

1986 ◽  
Vol 17 (30) ◽  
Author(s):  
A. H. A. TINNEMANS ◽  
T. P. M. KOSTER ◽  
D. H. M. W. THEWISSEN ◽  
A. MACKOR ◽  
J. SCHOONMAN

2020 ◽  
Vol 31 (20) ◽  
pp. 17892-17902
Author(s):  
Karolina Piętak ◽  
Sebastian Złotnik ◽  
Ewelina Rozbiegała ◽  
Paweł P. Michałowski ◽  
Marek Wójcik ◽  
...  

AbstractPhosphorus introduction into Mg-doped aluminium gallium nitride ((Al)GaN) epilayers to enhance the acceptor activation is a possible strategy for a p-type conductivity improvement in III-nitride wide-bandgap semiconductors. To date, P-implanted Mg-doped (Al)GaN structures have not been systematically evaluated, regarding structural verification and elemental distribution. Here, comprehensive studies of P ions impact on structural degradation are presented. Furthermore, a post-implantation annealing conducted at different temperatures is examined as well. The results demonstrated that the structural changes in the examined compounds, namely GaN and Al0.1Ga0.9N, due to P implantation and a subsequent recovery by thermal annealing follow similar trends. Interestingly, it was revealed that P diffusion length is higher in AlGaN than in GaN, possibly due to higher oxygen content in Al-containing compounds, analogous to Mg dopant. Additionally, the initial Mg concentration in (Al)GaN is crucial because too high Mg doping could be the main cause of electrical properties degradation of (Al)GaN heterostructures after P ion implantation.


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