Parasitic resistance and leakage reduction by raised source / drain extention fabricated with cluster ion implantation and millisecond annealing

2008 ◽  
Author(s):  
Koichi Yako ◽  
Toyoji Yamamoto ◽  
Kazuya Uejima ◽  
Takeo Ikezawa ◽  
Masami Hane
Keyword(s):  
Ion Implantation ◽  
Leakage Reduction ◽  
Parasitic Resistance ◽  
Cluster Ion

Damage control with cluster ion implantation

2013 ◽  
Author(s):  
Shigeki Sakai ◽  
Nariaki Hamamoto ◽  
Yoshiki Nakashima ◽  
Hiroshi Onoda
Keyword(s):  
Ion Implantation ◽  
Damage Control ◽  
Cluster Ion

Cluster Ion Implantation for Process Application -Carbon Cluster co-Implantation-

2011 ◽  
Author(s):  
M. Tanjyo ◽  
T. Nagayama ◽  
H. Onoda ◽  
N. Hamamoto ◽  
S. Umisedo ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Carbon Cluster ◽  
Cluster Ion

scholarly journals Defect characteristics by boron cluster ion implantation

2003 ◽  
Vol 206 ◽  
pp. 855-860 ◽  
Author(s):  
Takaaki Aoki ◽  
Jiro Matsuo ◽  
Gikan Takaoka ◽  
Noriaki Toyoda ◽  
Isao Yamada
Keyword(s):  
Ion Implantation ◽  
Boron Cluster ◽  
Cluster Ion

Vacancy-Type Defects Introduced by Gas Cluster Ion-Implantation on Si Studied by Monoenergetic Positron Beams

2012 ◽  
Vol 51 (11R) ◽  
pp. 111801 ◽  
Author(s):  
Akira Uedono ◽  
Tsuyoshi Moriya ◽  
Takuro Tsutsui ◽  
Shogo Kimura ◽  
Nagayasu Oshima ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Cluster Ion ◽  
Positron Beams

Applications of cluster ion implantation in microelectronics devices

1999 ◽  
Author(s):  
Isao Yamada ◽  
Jiro Matsuo ◽  
Noriaki Toyoda ◽  
Takaaki Aoki
Keyword(s):  
Ion Implantation ◽  
Cluster Ion
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