Cluster Ion Implantation for Process Application -Carbon Cluster co-Implantation-

2011 ◽  
Author(s):  
M. Tanjyo ◽  
T. Nagayama ◽  
H. Onoda ◽  
N. Hamamoto ◽  
S. Umisedo ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Carbon Cluster ◽  
Cluster Ion

Proximity gettering technology for advanced CMOS image sensors using carbon cluster ion‐implantation technique: A review

2017 ◽  
Vol 214 (7) ◽  
pp. 1700216 ◽  
Author(s):  
Kazunari Kurita ◽  
Takeshi Kadono ◽  
Ryousuke Okuyama ◽  
Satoshi Shigemastu ◽  
Ryo Hirose ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Carbon Cluster ◽  
Image Sensors ◽  
Implantation Technique ◽  
Cmos Image Sensors ◽  
Cluster Ion

scholarly journals Proximity gettering technology for advanced CMOS image sensors using carbon cluster ion‐implantation technique: A review (Phys. Status Solidi A 7∕2017)

2017 ◽  
Vol 214 (7) ◽  
pp. 1770141
Author(s):  
Kazunari Kurita ◽  
Takeshi Kadono ◽  
Ryousuke Okuyama ◽  
Satoshi Shigemastu ◽  
Ryo Hirose ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Carbon Cluster ◽  
Image Sensors ◽  
Implantation Technique ◽  
Cmos Image Sensors ◽  
Cluster Ion

Trapping and diffusion kinetic of hydrogen in carbon-cluster ion-implantation projected range in Czochralski silicon wafers

2017 ◽  
Vol 56 (2) ◽  
pp. 025601 ◽  
Author(s):  
Ryosuke Okuyama ◽  
Ayumi Masada ◽  
Takeshi Kadono ◽  
Ryo Hirose ◽  
Yoshihiro Koga ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Carbon Cluster ◽  
Silicon Wafers ◽  
Diffusion Kinetic ◽  
Czochralski Silicon ◽  
Projected Range ◽  
Cluster Ion ◽  
And Diffusion

scholarly journals Gettering Sinks for Metallic Impurities Formed by Carbon-Cluster Ion Implantation in Epitaxial Silicon Wafers for CMOS Image Sensor

2018 ◽  
Vol 6 ◽  
pp. 1200-1206 ◽  
Author(s):  
Ayumi Onaka-Masada ◽  
Ryosuke Okuyama ◽  
Satoshi Shigematsu ◽  
Hidehiko Okuda ◽  
Takeshi Kadono ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Cmos Image Sensor ◽  
Image Sensor ◽  
Carbon Cluster ◽  
Silicon Wafers ◽  
Epitaxial Silicon ◽  
Cluster Ion ◽  
Metallic Impurities

ChemInform Abstract: [12.12]Paracyclophanedodecaynes C36H8 and C36Cl8: The Smallest Paracyclophynes and Their Transformation into the Carbon Cluster Ion C-36.

ChemInform ◽  
2010 ◽  
Vol 33 (8) ◽  
pp. no-no
Author(s):  
Yoshito Tobe ◽  
Ryutaro Furukawa ◽  
Motohiro Sonoda ◽  
Tomonari Wakabayashi
Keyword(s):  
Carbon Cluster ◽  
Cluster Ion

Damage control with cluster ion implantation

2013 ◽  
Author(s):  
Shigeki Sakai ◽  
Nariaki Hamamoto ◽  
Yoshiki Nakashima ◽  
Hiroshi Onoda
Keyword(s):  
Ion Implantation ◽  
Damage Control ◽  
Cluster Ion
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