Parametric study of the electron temperature and density in dusty low-pressure RF plasmas with pulsed injection of hexamethyldisiloxane

2016 ◽  
Author(s):  
Vincent Garofano ◽  
Luc Stafford ◽  
Bernard Despax ◽  
Richard Clergeraux ◽  
Kremena Makasheva
Keyword(s):  
Electron Temperature ◽  
Parametric Study ◽  
Low Pressure ◽  
Rf Plasmas ◽  
Pulsed Injection

Cyclic evolution of the electron temperature and density in dusty low-pressure radio frequency plasmas with pulsed injection of hexamethyldisiloxane

2015 ◽  
Vol 107 (18) ◽  
pp. 183104 ◽  
Author(s):  
V. Garofano ◽  
L. Stafford ◽  
B. Despax ◽  
R. Clergereaux ◽  
K. Makasheva
Keyword(s):  
Radio Frequency ◽  
Electron Temperature ◽  
Low Pressure ◽  
Pulsed Injection

Parametric study of zirconia nanoparticle synthesis in low pressure flames

2001 ◽  
Vol 44 (8-9) ◽  
pp. 2259-2262 ◽  
Author(s):  
A Colibaba-Evulet ◽  
V Shukla ◽  
N.G Glumac ◽  
B Kear ◽  
F Cosandey
Keyword(s):  
Parametric Study ◽  
Nanoparticle Synthesis ◽  
Low Pressure ◽  
Zirconia Nanoparticle

scholarly journals Diagnostics of low-pressure capacitively coupled RF discharge argon plasma

2019 ◽  
Vol 13 (27) ◽  
pp. 76-82
Author(s):  
Kadhim A. Aadim
Keyword(s):  
Electron Temperature ◽  
Electron Density ◽  
Langmuir Probe ◽  
Gas Flow ◽  
Low Pressure ◽  
Gas Pressure ◽  
Rf Discharge ◽  
Electrode Gap ◽  
Probe Characteristic ◽  
Capacitively Coupled

Low-pressure capacitively coupled RF discharge Ar plasma has been studied using Langmuir probe. The electron temperature, electron density and Debay length were calculated under different pressures and electrode gap. In this work the RF Langmuir probe is designed using 4MHz filter as compensation circuit and I-V probe characteristic have been investigated. The pressure varied from 0.07 mbar to 0.1 mbar while electrode gap varied from 2-5 cm. The plasma was generated using power supply at 4MHz frequency with power 300 W. The flowmeter is used to control Argon gas flow in the range of 600 standard cubic centimeters per minute (sccm). The electron temperature drops slowly with pressure and it's gradually decreased when expanding the electrode gap. As the gas pressure increases, the plasma density rises slightly at low gas pressure while it drops little at higher gas pressure. The electron density decreases rapidly with expand distances between electrodes.

An efficient Monte Carlo simulator for low-pressure RF plasmas

1997 ◽  
Vol 25 (5) ◽  
pp. 1081-1085 ◽  
Author(s):  
M. Ardehali ◽  
H. Matsumoto
Keyword(s):  
Monte Carlo ◽  
Low Pressure ◽  
Rf Plasmas ◽  
Monte Carlo Simulator

Characterization and global modelling of low-pressure hydrogen-based RF plasmas suitable for surface cleaning processes

2013 ◽  
Vol 46 (47) ◽  
pp. 475206 ◽  
Author(s):  
Nikola Škoro ◽  
Nevena Puač ◽  
Saša Lazović ◽  
Uroš Cvelbar ◽  
George Kokkoris ◽  
...  
Keyword(s):  
Low Pressure ◽  
Surface Cleaning ◽  
Rf Plasmas ◽  
Global Modelling ◽  
Pressure Hydrogen
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