Cyclic evolution of the electron temperature and density in dusty low-pressure radio frequency plasmas with pulsed injection of hexamethyldisiloxane

2015 ◽  
Vol 107 (18) ◽  
pp. 183104 ◽  
Author(s):  
V. Garofano ◽  
L. Stafford ◽  
B. Despax ◽  
R. Clergereaux ◽  
K. Makasheva
Keyword(s):  
Radio Frequency ◽  
Electron Temperature ◽  
Low Pressure ◽  
Pulsed Injection

Increasing the capillary of fiberglass under the application of a relief coating in the low-pressure radio-frequency induction discharge

2019 ◽  
Vol 1328 ◽  
pp. 012069
Author(s):  
E A Skidchenko ◽  
E F Voznesensky ◽  
V A Sysoev ◽  
G G Lutfullina ◽  
A E Karnouhov ◽  
...  
Keyword(s):  
Radio Frequency ◽  
Low Pressure ◽  
Induction Discharge

Experimental Investigation on Electromagnetic Attenuation by Low Pressure Radio-Frequency Plasma for Cavity Structure

2016 ◽  
Vol 18 (1) ◽  
pp. 62-66 ◽  
Author(s):  
Xiang He ◽  
Yachun Zhang ◽  
Jianping Chen ◽  
Yudong Chen ◽  
Xiaojun Zeng ◽  
...  
Keyword(s):  
Experimental Investigation ◽  
Radio Frequency ◽  
Low Pressure ◽  
Radio Frequency Plasma ◽  
Frequency Plasma ◽  
Cavity Structure

scholarly journals Self-excited instability occurring during the nanoparticle formation in an Ar–SiH4 low pressure radio frequency plasma

2006 ◽  
Vol 99 (6) ◽  
pp. 064301 ◽  
Author(s):  
M. Cavarroc ◽  
M. C. Jouanny ◽  
K. Radouane ◽  
M. Mikikian ◽  
L. Boufendi
Keyword(s):  
Radio Frequency ◽  
Low Pressure ◽  
Radio Frequency Plasma ◽  
Nanoparticle Formation ◽  
Frequency Plasma

scholarly journals Uses of radio emission spectroscopy for non-contact and in situ diagnostics of low pressure radio frequency plasma processing

2021 ◽  
Author(s):  
Rajani K. Vijayaraghavan ◽  
Sean Kelly ◽  
David Coates ◽  
Cezar Gaman ◽  
Niall MacGearailt ◽  
...  
Keyword(s):  
Radio Emission ◽  
Radio Frequency ◽  
Emission Spectroscopy ◽  
Near Field ◽  
Plasma Processing ◽  
Diagnostic Technique ◽  
Primary Source ◽  
Low Pressure ◽  
Chamber Pressure ◽  
Rf Plasma

Abstract We demonstrate that a passive non-contact diagnostic technique, radio emission spectroscopy (RES), provides a sensitive monitor of currents in a low pressure radio frequency (RF) plasma. A near field magnetic loop antenna was used to capture RF emissions from the plasma without perturbing it. The analysis was implemented for a capacitively coupled RF plasma with an RF supply at a frequency of 13.56 MHz. Real-time measurements are captured in scenarios relevant to contemporary challenges faced during semiconductor fabrication (e.g. window coating and wall disturbance). Exploration of the technique for key equipment parameters including applied RF power, chamber pressure, RF bias frequencies and chamber wall cleanliness shows sensitive and repeatable function. In particular, the induced RES signal was found to vary sensitively to pressure changes and we were able to detect pressure and power variations as low as ~2.5 %/mtorr and ~3.5 %/watt, respectively, during the plasma processing during a trial generic plasma process. Finally, we explored the ability of RES to monitor the operation of a multiple frequency low-pressure RF plasma system (f1 = 2 MHz, f2 = 162 MHz) and intermixing products which suggests strongly that the plasma sheaths are the primary source of this non-linear diode mixing effect.

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