Deposition of thin film ceramics and ceramic nanocomposites by inductively coupled plasma assisted hybrid chemical/physical vapor deposition

ICOPS 2000. IEEE Conference Record - Abstracts. 27th IEEE International Conference on Plasma Science (Cat. No.00CH37087) ◽

10.1109/plasma.2000.854553 ◽

2005 ◽

Author(s):

Wen Jin Meng ◽

Bao Feng ◽

Dong Mei Cao

Keyword(s):

Thin Film ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Physical Vapor Deposition ◽

Inductively Coupled ◽

Ceramic Nanocomposites

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Antenna sputtering in an internal inductively coupled plasma for ionized physical vapor deposition

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.589857 ◽

1998 ◽

Vol 16 (2) ◽

pp. 532 ◽

Cited By ~ 21

Author(s):

J. E. Foster

Keyword(s):

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Physical Vapor Deposition ◽

Inductively Coupled ◽

Ionized Physical Vapor Deposition

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Preparation of a ‐ SiN x Thin Film with Low Hydrogen Content by Inductively Coupled Plasma Enhanced Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.1838318 ◽

1998 ◽

Vol 145 (2) ◽

pp. 652-658 ◽

Cited By ~ 37

Author(s):

Sang‐Soo Han ◽

Byung‐Hyuk Jun ◽

Kwangsoo No ◽

Byeong‐Soo Bae

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Hydrogen Content ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Inductively Coupled

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Effects of growth variables on the properties of single crystalline ZnO thin film grown by inductively coupled plasma metal organic chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2009.01.008 ◽

2009 ◽

Vol 517 (15) ◽

pp. 4432-4435 ◽

Cited By ~ 9

Author(s):

Ju-Hoon Park ◽

Chang-Bae Lee ◽

Il-Soo Kim ◽

Seong-Joo Jang ◽

Byung-Teak Lee

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Organic Chemical ◽

Zno Thin Film ◽

Inductively Coupled ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Effect of Inductively Coupled Plasma on the Electrical and Optical Properties of Indium Tin Oxide Films Deposited by Ionized Physical Vapor Deposition

ECS Meeting Abstracts ◽

10.1149/ma2012-02/39/2942 ◽

2012 ◽

Keyword(s):

Optical Properties ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Physical Vapor Deposition ◽

Electrical And Optical Properties ◽

Inductively Coupled ◽

Ionized Physical Vapor Deposition ◽

Tin Oxide Films

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Study of hydrogenated silicon thin film deposited by using dual-frequency inductively-coupled plasma-enhanced chemical-vapor deposition

Journal of the Korean Physical Society ◽

10.3938/jkps.63.1140 ◽

2013 ◽

Vol 63 (6) ◽

pp. 1140-1145 ◽

Cited By ~ 3

Author(s):

Ho Beom Jeong ◽

Kyong Nam Kim ◽

Nae Eung Lee ◽

Geun Young Yeom

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Dual Frequency ◽

Silicon Thin Film ◽

Hydrogenated Silicon ◽

Inductively Coupled

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Inductively coupled plasma assisted physical vapor deposition of titanium nitride coatings

Journal of Electronic Materials ◽

10.1007/s11664-997-0074-z ◽

1997 ◽

Vol 26 (11) ◽

pp. 1297-1302 ◽

Cited By ~ 33

Author(s):

W. J. Meng ◽

T. J. Curtis

Keyword(s):

Titanium Nitride ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Physical Vapor Deposition ◽

Inductively Coupled ◽

Nitride Coatings

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Coplanar amorphous silicon thin film transistor fabricated by inductively coupled plasma chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.368581 ◽

1998 ◽

Vol 84 (7) ◽

pp. 4006-4012 ◽

Cited By ~ 15

Author(s):

Sung Ki Kim ◽

Young Jin Choi ◽

Kyu Sik Cho ◽

Jin Jang

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Thin Film Transistor ◽

Chemical Vapor ◽

Plasma Chemical ◽

Silicon Thin Film ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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High quality nanocrystalline silicon thin film fabricated by inductively coupled plasma chemical vapor deposition at 350°C

Journal of Non-Crystalline Solids ◽

10.1016/j.jnoncrysol.2007.09.082 ◽

2008 ◽

Vol 354 (19-25) ◽

pp. 2268-2271 ◽

Cited By ~ 9

Author(s):

Sang-Myeon Han ◽

Sun-Jae Kim ◽

Joong-Hyun Park ◽

Sung-Hwan Choi ◽

Min-Koo Han

Keyword(s):

Thin Film ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Plasma Chemical ◽

Silicon Thin Film ◽

High Quality ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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Characterization of inductively coupled plasma in the ionized physical vapor deposition system

Journal of Applied Physics ◽

10.1063/1.1430897 ◽

2002 ◽

Vol 91 (4) ◽

pp. 1797-1803 ◽

Cited By ~ 14

Author(s):

K.-F. Chiu ◽

Z. H. Barber

Keyword(s):

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Physical Vapor Deposition ◽

Inductively Coupled ◽

Ionized Physical Vapor Deposition

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Inductively Coupled Plasma Chemical Vapor Deposition System for Thin Film Ppassivation of Top Emitting Organic Light Emitting Diodes

Journal of the Korean Institute of Electrical and Electronic Material Engineers ◽

10.4313/jkem.2006.19.6.538 ◽

2006 ◽

Vol 19 (6) ◽

pp. 538-546

Author(s):

Han-Ki Kim

Keyword(s):

Thin Film ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Organic Light Emitting Diodes ◽

Plasma Chemical ◽

Light Emitting ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

Organic Light

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