Electrical properties and microscopic structure of amorphous chalcogenides

Author(s):  
D. Ielmini ◽  
A. L. Lacaita
2012 ◽  
Vol 46 (7) ◽  
pp. 943-947 ◽  
Author(s):  
O. L. Kheifets ◽  
E. F. Shakirov ◽  
N. V. Melnikova ◽  
A. L. Filippov ◽  
L. L. Nugaeva

1996 ◽  
Vol 25 (3) ◽  
pp. 331-335 ◽  
Author(s):  
F. X. Zach ◽  
E. E. Haller ◽  
D. Gabbe ◽  
G. Iseler ◽  
G. G. Bryant ◽  
...  

2007 ◽  
Vol 280-283 ◽  
pp. 275-278
Author(s):  
Cheng Ju Zhang ◽  
Jin Feng Wang ◽  
Wen Bin Su ◽  
Guo Zhong Zang ◽  
Hong Cun Chen

The effects of Pr on the microstructure and nonlinear electrical properties of the (Co,Ta)-doped SnO2 varistors were investigated. It was found by characterizing the samples sintered at 1350 oC that the breakdown voltage increases significantly from 500v/mm to 1200v/mm, and the relative permittivity decreased rapidly from 2525 to 1199 with increasing Pr6O11 concentration from 0 to 1.20 mol%. The analysis of samples’ microscopic structure showed that the grain size of SnO2 rapidly decreases from 5.1 to 3.7 µm with increasing Pr6O11 concentration from 0 to 1.20mol% .The significant decrease of SnO2 grain size is the main reason for raising breakdown voltage and reducing permittivity.


2011 ◽  
Vol 687 ◽  
pp. 21-25 ◽  
Author(s):  
Jian Feng Zhu ◽  
Guo Quan Qi ◽  
Hai Bo Yang ◽  
Fen Wang

ZnO-based varistor ceramics were prepared by sintering ZnO powders with minor additives that were synthesized by standard ball milling, high energy ball milling for 10 h, and pyrogenic decomposition of nitrate. The microscopic structure and composition were analyzed by SEM and XRD respectively, and the electrical properties were investigated by a DC parameter instrument for varistors. Influences of composite additives on composition, microstructure, and electrical properties of ZnO-based varistors were studied. The ZnO varistor with optimum performance is prepared by the pyrogenic decomposition method and it has an average grain size of 5 µm and possesses a varistor voltage of about 561 V/mm, non linear coefficient of 75, and leakage current of 0.45 µA.


Author(s):  
Tamer Sheta ◽  
A.Hossam Gad ◽  
L.S. Nasrat ◽  
S.M. El-Debeiky

Ethylene Propylene Diene Monomer (EPDM) electrical properties are improved by adding Alumina Trihydrate (ATH) filler. Composite of EPDM with ATH filler are prepared with 10%, 20%, 30% and 40% percentages of concentration. The dielectric strength of the composite samples are tested under various thermal conditions such as (25, 70,100 and 130) ᵒC to simulate the various types of climates and clarify the effect of high temperature on the electrical properties of elastomers. Composite samples were exposed also to different climate conditions such as wet and salt. The obtained results of the composite performance are analyzed and discussed in the light of the variations of the material microscopic structure.  


Carbon ◽  
1982 ◽  
Vol 20 (3) ◽  
pp. 201-205 ◽  
Author(s):  
J.G. Hernandez ◽  
I. Hernandez-Calderon ◽  
Carlos A. Luengo ◽  
Raphael Tsu

Author(s):  
F. M. Ross ◽  
R. Hull ◽  
D. Bahnck ◽  
J. C. Bean ◽  
L. J. Peticolas ◽  
...  

We describe an investigation of the electrical properties of interfacial dislocations in strained layer heterostructures. We have been measuring both the structural and electrical characteristics of strained layer p-n junction diodes simultaneously in a transmission electron microscope, enabling us to correlate changes in the electrical characteristics of a device with the formation of dislocations.The presence of dislocations within an electronic device is known to degrade the device performance. This degradation is of increasing significance in the design and processing of novel strained layer devices which may require layer thicknesses above the critical thickness (hc), where it is energetically favourable for the layers to relax by the formation of misfit dislocations at the strained interfaces. In order to quantify how device performance is affected when relaxation occurs we have therefore been investigating the electrical properties of dislocations at the p-n junction in Si/GeSi diodes.


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